Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns

Joona Bang, Unyong Jeong, Du Yeol Ryu, Thomas P. Russell, Craig J Hawker

Research output: Contribution to journalReview article

544 Citations (Scopus)


The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

Original languageEnglish
Pages (from-to)4769-4792
Number of pages24
JournalAdvanced Materials
Issue number47
Publication statusPublished - 2009 Dec 18


All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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