Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns

Joona Bang, Unyong Jeong, Du Yeol Ryu, Thomas P. Russell, Craig J Hawker

Research output: Contribution to journalReview article

527 Citations (Scopus)

Abstract

The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

Original languageEnglish
Pages (from-to)4769-4792
Number of pages24
JournalAdvanced Materials
Volume21
Issue number47
DOIs
Publication statusPublished - 2009 Dec 18

Fingerprint

Nanolithography
Level control
Block copolymers
Nanostructured materials
Fabrication

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Bang, Joona ; Jeong, Unyong ; Ryu, Du Yeol ; Russell, Thomas P. ; J Hawker, Craig. / Block copolymer nanolithography : Translation of molecular level control to nanoscale patterns. In: Advanced Materials. 2009 ; Vol. 21, No. 47. pp. 4769-4792.
@article{6c7938911936462c84e519bf491bad8a,
title = "Block copolymer nanolithography: Translation of molecular level control to nanoscale patterns",
abstract = "The self-asembly of block copolymers is a promising platform for the {"}bottomup{"} fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.",
author = "Joona Bang and Unyong Jeong and Ryu, {Du Yeol} and Russell, {Thomas P.} and {J Hawker}, Craig",
year = "2009",
month = "12",
day = "18",
doi = "10.1002/adma.200803302",
language = "English",
volume = "21",
pages = "4769--4792",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "47",

}

Block copolymer nanolithography : Translation of molecular level control to nanoscale patterns. / Bang, Joona; Jeong, Unyong; Ryu, Du Yeol; Russell, Thomas P.; J Hawker, Craig.

In: Advanced Materials, Vol. 21, No. 47, 18.12.2009, p. 4769-4792.

Research output: Contribution to journalReview article

TY - JOUR

T1 - Block copolymer nanolithography

T2 - Translation of molecular level control to nanoscale patterns

AU - Bang, Joona

AU - Jeong, Unyong

AU - Ryu, Du Yeol

AU - Russell, Thomas P.

AU - J Hawker, Craig

PY - 2009/12/18

Y1 - 2009/12/18

N2 - The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

AB - The self-asembly of block copolymers is a promising platform for the "bottomup" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

UR - http://www.scopus.com/inward/record.url?scp=73949116174&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=73949116174&partnerID=8YFLogxK

U2 - 10.1002/adma.200803302

DO - 10.1002/adma.200803302

M3 - Review article

C2 - 21049495

AN - SCOPUS:73949116174

VL - 21

SP - 4769

EP - 4792

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 47

ER -