Calculation of three-dimensional profiles of photoresist exposed by localized electric fields of high-transmission metal nano-apertures

Physics

• Theoretical Model 100%
• Metal 100%
• Lithography 50%
• Electric Fields 50%
• Finite Difference Time Domain Method 50%
• Domains 50%
• Distance 50%
• Information 50%
• Simulation 50%
• Independent Variables 50%
• Contrast 50%
• Calculation 50%
• Gaps 50%

Material Science

• Nanopatterning 100%
• Finite Difference 50%