Change in band alignment of nitrided Hf-silicate films grown on Ge(001) using gaseous NH3

Y. J. Cho, J. W. Mah, C. Y. Kim, H. Kim, H. J. Lee, H. J. Kang, D. W. Moon, S. O. Kim, M. H. Cho

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy