Channel doping-dependent analytical model for symmetric double gate metal-oxide-semiconductor field-effect transistor. I. Extraction of subthreshold characteristics

Edward Namkyu Cho, Yong Hyeon Shin, Ilgu Yun

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

An analytical 2D model of subthreshold current (IDSsub), subthreshold swing (Ssub), and threshold voltage (VTH) roll-off with a variation of channel doping concentration (NA) for symmetric double gate (DG) metal-oxide-semiconductor field-effect transistor (MOSFET) is presented. First of all, the channel potential is obtained by solving the 2D Poisson's equation with the help of the evanescent method. Based on the obtained channel potential, IDSsub, Ssub, and VTH roll-off expressions are derived in the analytical model. It is shown that the subthreshold characteristics predicted by the analytical model are in good agreement with commercially available 2D numerical simulation results for different channel length (L), channel film thickness (t si), gate oxide (tox), and NA.

Original languageEnglish
Article number214506
JournalJournal of Applied Physics
Volume113
Issue number21
DOIs
Publication statusPublished - 2013 Jun 7

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metal oxide semiconductors
field effect transistors
Poisson equation
threshold voltage
film thickness
oxides
simulation

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

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abstract = "An analytical 2D model of subthreshold current (IDSsub), subthreshold swing (Ssub), and threshold voltage (VTH) roll-off with a variation of channel doping concentration (NA) for symmetric double gate (DG) metal-oxide-semiconductor field-effect transistor (MOSFET) is presented. First of all, the channel potential is obtained by solving the 2D Poisson's equation with the help of the evanescent method. Based on the obtained channel potential, IDSsub, Ssub, and VTH roll-off expressions are derived in the analytical model. It is shown that the subthreshold characteristics predicted by the analytical model are in good agreement with commercially available 2D numerical simulation results for different channel length (L), channel film thickness (t si), gate oxide (tox), and NA.",
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Channel doping-dependent analytical model for symmetric double gate metal-oxide-semiconductor field-effect transistor. I. Extraction of subthreshold characteristics. / Cho, Edward Namkyu; Shin, Yong Hyeon; Yun, Ilgu.

In: Journal of Applied Physics, Vol. 113, No. 21, 214506, 07.06.2013.

Research output: Contribution to journalArticle

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