Channel strain measurement of Si1-xCx structures: Effects of gate length, source/drain length, and source/drain elevation

Sun Wook Kim, Dae Seop Byun, Mijin Jung, Saurabh Chopra, Yihwan Kim, Jae Hyun Kim, Seung Min Han, Dae Hong Ko, Hoo Jeong Lee

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

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