Characteristics of the nanoscale titanium film deposited by plasma enhanced chemical vapor deposition and comparison of the film properties with the film by physical vapor deposition

Joo Wan Lee, Soo Hyun Kim, No Jung Kwak, Young Jin Lee, Hyun Chul Sohn, Jin Woong Kim, Ho Jung Sun

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science

Physics & Astronomy