Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation

Mann-Ho Cho, J. S. Shin, Y. S. Roh, I. W. Lyo, KwangHo Jeong, C. N. Whang, J. S. Lee, J. Y. Yoo, N. I. Lee, K. Fujihara, Dae Won Moon

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The defects in the gate oxide were directly characterized by MEIS and HRXPS measurements. Furthermore, it was observed that there is a clear difference between STM images of dry and wet oxidized samples in the defect generation rate and TDDB. These results strongly suggest that the wet oxide using H2O formed by catalysis of Pt has a smoother interfacial roughness and fewer defects than the dry oxide.

Original languageEnglish
Pages (from-to)1004-1008
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number4
DOIs
Publication statusPublished - 2003 Jul 1

Fingerprint

Ultrathin films
Oxides
Oxidation
Defects
oxidation
oxides
defects
Catalysis
catalysis
roughness
Surface roughness
Hot Temperature

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Cho, Mann-Ho ; Shin, J. S. ; Roh, Y. S. ; Lyo, I. W. ; Jeong, KwangHo ; Whang, C. N. ; Lee, J. S. ; Yoo, J. Y. ; Lee, N. I. ; Fujihara, K. ; Moon, Dae Won. / Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2003 ; Vol. 21, No. 4. pp. 1004-1008.
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author = "Mann-Ho Cho and Shin, {J. S.} and Roh, {Y. S.} and Lyo, {I. W.} and KwangHo Jeong and Whang, {C. N.} and Lee, {J. S.} and Yoo, {J. Y.} and Lee, {N. I.} and K. Fujihara and Moon, {Dae Won}",
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Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation. / Cho, Mann-Ho; Shin, J. S.; Roh, Y. S.; Lyo, I. W.; Jeong, KwangHo; Whang, C. N.; Lee, J. S.; Yoo, J. Y.; Lee, N. I.; Fujihara, K.; Moon, Dae Won.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 21, No. 4, 01.07.2003, p. 1004-1008.

Research output: Contribution to journalArticle

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T1 - Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation

AU - Cho, Mann-Ho

AU - Shin, J. S.

AU - Roh, Y. S.

AU - Lyo, I. W.

AU - Jeong, KwangHo

AU - Whang, C. N.

AU - Lee, J. S.

AU - Yoo, J. Y.

AU - Lee, N. I.

AU - Fujihara, K.

AU - Moon, Dae Won

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