Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Sung Jin Jo, Chang Su Kim, Seung Yoon Ryu, Jong Bok Kim, Joo Hyon Noh, Se Jong Lee, Hong Koo Baik

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The CF4 plasma treatment of indium-tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.

Original languageEnglish
Pages (from-to)6814-6816
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number10 A
DOIs
Publication statusPublished - 2007 Oct 9

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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