Characterization of mesoporous silica thin films for application to thermal isolation layer

Junmyung Lee, Jihun Kim, Byung Jun Lee, Jongchan Lee, Hyun Woo Lee, Min Hee Hong, Hyung Ho Park, Dong Il Shim, Hyung Hee Cho, Kwang Ho Kwon

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Mesoporous silica thin films were easily prepared by a sol–gel process and spin-coating, and the film properties were investigated for potential application to thermal isolation layers. Scanning electron microscopy and X-ray diffraction were used to determine the film thicknesses and to analyze the mesoporous film structures, respectively. The refractive indexes and porosities of the films were determined by spectroscopic ellipsometry and the Lorentz–Lorenz equation, respectively. The infrared absorptions and thermal conductivities of the films were measured by Fourier transform infrared spectroscopy and a 3-ω method, respectively. The porosity and the number of pores of the films increased with increasing Brij-76 surfactant concentration, the interpore distance and thermal conductivity decreased. The experimental results showed that the mesoporous silica thin films could be function as excellent thermal isolation layers.

Original languageEnglish
JournalThin Solid Films
DOIs
Publication statusAccepted/In press - 2018 Jan 1

Fingerprint

Silicon Dioxide
isolation
Silica
silicon dioxide
Thin films
thin films
porosity
Thermal conductivity
thermal conductivity
Porosity
conductivity
Spectroscopic ellipsometry
Infrared absorption
Spin coating
Surface-Active Agents
infrared absorption
ellipsometry
Fourier transform infrared spectroscopy
Film thickness
coating

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Lee, J., Kim, J., Lee, B. J., Lee, J., Lee, H. W., Hong, M. H., ... Kwon, K. H. (Accepted/In press). Characterization of mesoporous silica thin films for application to thermal isolation layer. Thin Solid Films. https://doi.org/10.1016/j.tsf.2018.04.001
Lee, Junmyung ; Kim, Jihun ; Lee, Byung Jun ; Lee, Jongchan ; Lee, Hyun Woo ; Hong, Min Hee ; Park, Hyung Ho ; Shim, Dong Il ; Cho, Hyung Hee ; Kwon, Kwang Ho. / Characterization of mesoporous silica thin films for application to thermal isolation layer. In: Thin Solid Films. 2018.
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Characterization of mesoporous silica thin films for application to thermal isolation layer. / Lee, Junmyung; Kim, Jihun; Lee, Byung Jun; Lee, Jongchan; Lee, Hyun Woo; Hong, Min Hee; Park, Hyung Ho; Shim, Dong Il; Cho, Hyung Hee; Kwon, Kwang Ho.

In: Thin Solid Films, 01.01.2018.

Research output: Contribution to journalArticle

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AU - Kim, Jihun

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AU - Lee, Jongchan

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AU - Hong, Min Hee

AU - Park, Hyung Ho

AU - Shim, Dong Il

AU - Cho, Hyung Hee

AU - Kwon, Kwang Ho

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