Characterization of poly-Si TFT array on plastic substrate for AMOLED

Jang Yeon Kwon, Do Young Kim, Ji Sim Jung, Jong Man Kim, Hyuck Lim, Kyung Bae Park, Hans S. Cho, Xiaoxin Zhang, Huaxiang Yin, Wenyu Xianyu, Takashi Noguchi

Research output: Contribution to conferencePaper

Abstract

We present the characterization of poly-Si TFT fabricated below 170°C on plastic substrate using excimer laser crystallization of Xe sputtered Si films and gate insulator by using inductively coupled plasma CVD. In addition, stability and uniformity of TFT array between before and after sintering will be compared.

Original languageEnglish
Pages1133-1135
Number of pages3
Publication statusPublished - 2005 Dec 1
EventIDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005 - Takamatsu, Japan
Duration: 2005 Dec 62005 Dec 9

Other

OtherIDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005
CountryJapan
CityTakamatsu
Period05/12/605/12/9

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All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Kwon, J. Y., Kim, D. Y., Jung, J. S., Kim, J. M., Lim, H., Park, K. B., Cho, H. S., Zhang, X., Yin, H., Xianyu, W., & Noguchi, T. (2005). Characterization of poly-Si TFT array on plastic substrate for AMOLED. 1133-1135. Paper presented at IDW/AD'05 - 12th International Display Workshops in Conjunction with Asia Display 2005, Takamatsu, Japan.