Chemical vapor deposition-grown graphene: The thinnest solid lubricant

Kwang Seop Kim; Hee Jung Lee; Changgu Lee; Seoung Ki Lee; Houk Jang; Jong Hyun Ahn; Jae Hyun Kim; Hak Joo Lee

doi:10.1021/nn2011865

Chemical vapor deposition-grown graphene: The thinnest solid lubricant

Kwang Seop Kim, Hee Jung Lee, Changgu Lee, Seoung Ki Lee, Houk Jang, Jong Hyun Ahn, Jae Hyun Kim, Hak Joo Lee

Department of Electrical and Electronic Engineering

Research output: Contribution to journal › Article › peer-review

391 Citations (Scopus)

Abstract

As an atomically thin material with low surface energy, graphene is an excellent candidate for reducing adhesion and friction when coated on various surfaces. Here, we demonstrate the superior adhesion and frictional characteristics of graphene films which were grown on Cu and Ni metal catalysts by chemical vapor deposition and transferred onto the SiO₂/Si substrate. The graphene films effectively reduced the adhesion and friction forces, and multilayer graphene films that were a few nanometers thick had low coefficients of friction comparable to that of bulk graphite.

Original language	English
Pages (from-to)	5107-5114
Number of pages	8
Journal	ACS Nano
Volume	5
Issue number	6
DOIs	https://doi.org/10.1021/nn2011865
Publication status	Published - 2011 Jun 28

All Science Journal Classification (ASJC) codes

Materials Science(all)
Engineering(all)
Physics and Astronomy(all)

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10.1021/nn2011865

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AU - Ahn, Jong Hyun

AU - Kim, Jae Hyun

AU - Lee, Hak Joo

PY - 2011/6/28

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Chemical vapor deposition-grown graphene: The thinnest solid lubricant

Abstract

All Science Journal Classification (ASJC) codes

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