Clean transfer of graphene and its effect on contact resistance

Jooho Lee, Yongsung Kim, Hyeon Jin Shin, Changseung Lee, Dongwook Lee, Chang Yul Moon, Juhwan Lim, Seong Chan Jun

Research output: Contribution to journalArticle

44 Citations (Scopus)

Abstract

We demonstrate herein an effective method of forming a high-quality contact between metal and graphene on a wafer as large as 6 in. This gold-assisted transfer method producing no polymer residue on the graphene surface is introduced, and then the gold film is used directly as an electrode to form the transfer length method pattern for calculating the contact resistance. The graphene surface obtained using the gold-assisted transfer method is clean and uniform without residue or contamination, and its contact resistance is at least 60% lower than that obtained using the conventional poly(methyl methacrylate) assisted transfer method.

Original languageEnglish
Article number103104
JournalApplied Physics Letters
Volume103
Issue number10
DOIs
Publication statusPublished - 2013 Sep 2

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Clean transfer of graphene and its effect on contact resistance'. Together they form a unique fingerprint.

  • Cite this

    Lee, J., Kim, Y., Shin, H. J., Lee, C., Lee, D., Moon, C. Y., Lim, J., & Chan Jun, S. (2013). Clean transfer of graphene and its effect on contact resistance. Applied Physics Letters, 103(10), [103104]. https://doi.org/10.1063/1.4819740