Cobalt titanium nitride amorphous metal alloys by atomic layer deposition

Taewook Nam, Chang Wan Lee, Taehoon Cheon, Woo Jae Lee, Soo Hyun Kim, Se Hun Kwon, Han Bo Ram Lee, Hyungjun Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The formation of thin amorphous cobalt titanium nitride (CoTiN) layers was investigated using a supercycle method of atomic layer deposition (ALD). The stoichiometry of the resultant ALD CoTiN films was controlled by changing the ratio of Co and TiN thicknesses. X-ray diffraction analysis and transmission electron microscopy observations showed that the microstructure of the ALD Co and TiN was transformed from polycrystalline to amorphous CoTiN. The stoichiometry of the CoTiN layer was affected by the growth characteristics of ALD Co and TiN on each surface. The results revealed that ALD TiN undergoes nucleation incubation on the ALD Co surface, whereas ALD Co does not undergo nucleation incubation on the ALD TiN surface. The properties of the amorphous CoTiN layers were evaluated by diffusion experiments and mechanical tests. Because of the lack of grain boundaries, the CoTiN efficiently blocks the diffusion of Cu at elevated temperatures and exhibits higher hardness compared with ALD Co.

Original languageEnglish
Pages (from-to)684-692
Number of pages9
JournalJournal of Alloys and Compounds
Volume737
DOIs
Publication statusPublished - 2018 Mar 15

Fingerprint

Titanium nitride
Atomic layer deposition
Cobalt
Metals
Stoichiometry
Nucleation
titanium nitride
X ray diffraction analysis
Grain boundaries
Hardness
Transmission electron microscopy
Microstructure

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

Cite this

Nam, Taewook ; Lee, Chang Wan ; Cheon, Taehoon ; Lee, Woo Jae ; Kim, Soo Hyun ; Kwon, Se Hun ; Lee, Han Bo Ram ; Kim, Hyungjun. / Cobalt titanium nitride amorphous metal alloys by atomic layer deposition. In: Journal of Alloys and Compounds. 2018 ; Vol. 737. pp. 684-692.
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abstract = "The formation of thin amorphous cobalt titanium nitride (CoTiN) layers was investigated using a supercycle method of atomic layer deposition (ALD). The stoichiometry of the resultant ALD CoTiN films was controlled by changing the ratio of Co and TiN thicknesses. X-ray diffraction analysis and transmission electron microscopy observations showed that the microstructure of the ALD Co and TiN was transformed from polycrystalline to amorphous CoTiN. The stoichiometry of the CoTiN layer was affected by the growth characteristics of ALD Co and TiN on each surface. The results revealed that ALD TiN undergoes nucleation incubation on the ALD Co surface, whereas ALD Co does not undergo nucleation incubation on the ALD TiN surface. The properties of the amorphous CoTiN layers were evaluated by diffusion experiments and mechanical tests. Because of the lack of grain boundaries, the CoTiN efficiently blocks the diffusion of Cu at elevated temperatures and exhibits higher hardness compared with ALD Co.",
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Cobalt titanium nitride amorphous metal alloys by atomic layer deposition. / Nam, Taewook; Lee, Chang Wan; Cheon, Taehoon; Lee, Woo Jae; Kim, Soo Hyun; Kwon, Se Hun; Lee, Han Bo Ram; Kim, Hyungjun.

In: Journal of Alloys and Compounds, Vol. 737, 15.03.2018, p. 684-692.

Research output: Contribution to journalArticle

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T1 - Cobalt titanium nitride amorphous metal alloys by atomic layer deposition

AU - Nam, Taewook

AU - Lee, Chang Wan

AU - Cheon, Taehoon

AU - Lee, Woo Jae

AU - Kim, Soo Hyun

AU - Kwon, Se Hun

AU - Lee, Han Bo Ram

AU - Kim, Hyungjun

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AB - The formation of thin amorphous cobalt titanium nitride (CoTiN) layers was investigated using a supercycle method of atomic layer deposition (ALD). The stoichiometry of the resultant ALD CoTiN films was controlled by changing the ratio of Co and TiN thicknesses. X-ray diffraction analysis and transmission electron microscopy observations showed that the microstructure of the ALD Co and TiN was transformed from polycrystalline to amorphous CoTiN. The stoichiometry of the CoTiN layer was affected by the growth characteristics of ALD Co and TiN on each surface. The results revealed that ALD TiN undergoes nucleation incubation on the ALD Co surface, whereas ALD Co does not undergo nucleation incubation on the ALD TiN surface. The properties of the amorphous CoTiN layers were evaluated by diffusion experiments and mechanical tests. Because of the lack of grain boundaries, the CoTiN efficiently blocks the diffusion of Cu at elevated temperatures and exhibits higher hardness compared with ALD Co.

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