Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors

Il Kwon Oh, Bo Eun Park, Seunggi Seo, Byung Chul Yeo, Jukka Tanskanen, Han Bo Ram Lee, Woo Hee Kim, Hyungjun Kim

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Downscaling of complementary metal-oxide semiconductor (CMOS) gate stacks requires the introduction of ultra-thin and high-k dielectrics such as HfO2. Atomic layer deposition (ALD) is an excellent technique for producing high-quality high-k films. During ALD, chemical reactions on the substrate surface involve multiple processes that affect the chemical and electrical properties of the deposited films. Thus, the choice of an appropriate precursor for ALD is critical for obtaining high-quality high-k films, leading to good device performance. The aim of this study is to understand the surface reactions during the film growth along with the evaluation of the electrical properties of HfO2 deposited using two different Hf precursors, HfCl4 and Hf(N(CH3)2)4. The growth behavior and electrical performance of ALD HfO2 thin films obtained using the two Hf precursors and H2O as an oxidant at 250 °C are studied comparatively and discussed as a function of the process parameters, together with surface-reaction energetics determined by the density functional theory. Compared to Hf(N(CH3)2)4, the HfCl4 shows unfavorable nucleation behavior on the starting Si-OH surfaces. In addition, a more stoichiometric HfO2 film results from HfCl4 owing to its high reactivity, leading to lower leakage currents of Si-based devices than that of the film obtained from Hf(N(CH3)2)4. Further, HfCl4 showed better nucleation on a 2D graphene substrate, leading to superior electrical performance in graphene-based field effect transistors. These results provide practical insights on selecting a suitable Hf precursor for producing gate dielectric layers for future nanoelectronics.

Original languageEnglish
Pages (from-to)7367-7376
Number of pages10
JournalJournal of Materials Chemistry C
Volume6
Issue number27
DOIs
Publication statusPublished - 2018 Jan 1

Fingerprint

Metal halides
Amides
Atomic layer deposition
Electric properties
Graphite
Surface reactions
Graphene
Nucleation
Nanoelectronics
Gate dielectrics
Film growth
Substrates
Field effect transistors
Oxidants
Leakage currents
Chemical properties
Density functional theory
Chemical reactions
Metals
Thin films

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

Cite this

Oh, Il Kwon ; Park, Bo Eun ; Seo, Seunggi ; Yeo, Byung Chul ; Tanskanen, Jukka ; Lee, Han Bo Ram ; Kim, Woo Hee ; Kim, Hyungjun. / Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors. In: Journal of Materials Chemistry C. 2018 ; Vol. 6, No. 27. pp. 7367-7376.
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abstract = "Downscaling of complementary metal-oxide semiconductor (CMOS) gate stacks requires the introduction of ultra-thin and high-k dielectrics such as HfO2. Atomic layer deposition (ALD) is an excellent technique for producing high-quality high-k films. During ALD, chemical reactions on the substrate surface involve multiple processes that affect the chemical and electrical properties of the deposited films. Thus, the choice of an appropriate precursor for ALD is critical for obtaining high-quality high-k films, leading to good device performance. The aim of this study is to understand the surface reactions during the film growth along with the evaluation of the electrical properties of HfO2 deposited using two different Hf precursors, HfCl4 and Hf(N(CH3)2)4. The growth behavior and electrical performance of ALD HfO2 thin films obtained using the two Hf precursors and H2O as an oxidant at 250 °C are studied comparatively and discussed as a function of the process parameters, together with surface-reaction energetics determined by the density functional theory. Compared to Hf(N(CH3)2)4, the HfCl4 shows unfavorable nucleation behavior on the starting Si-OH surfaces. In addition, a more stoichiometric HfO2 film results from HfCl4 owing to its high reactivity, leading to lower leakage currents of Si-based devices than that of the film obtained from Hf(N(CH3)2)4. Further, HfCl4 showed better nucleation on a 2D graphene substrate, leading to superior electrical performance in graphene-based field effect transistors. These results provide practical insights on selecting a suitable Hf precursor for producing gate dielectric layers for future nanoelectronics.",
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Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors. / Oh, Il Kwon; Park, Bo Eun; Seo, Seunggi; Yeo, Byung Chul; Tanskanen, Jukka; Lee, Han Bo Ram; Kim, Woo Hee; Kim, Hyungjun.

In: Journal of Materials Chemistry C, Vol. 6, No. 27, 01.01.2018, p. 7367-7376.

Research output: Contribution to journalArticle

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T1 - Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors

AU - Oh, Il Kwon

AU - Park, Bo Eun

AU - Seo, Seunggi

AU - Yeo, Byung Chul

AU - Tanskanen, Jukka

AU - Lee, Han Bo Ram

AU - Kim, Woo Hee

AU - Kim, Hyungjun

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AB - Downscaling of complementary metal-oxide semiconductor (CMOS) gate stacks requires the introduction of ultra-thin and high-k dielectrics such as HfO2. Atomic layer deposition (ALD) is an excellent technique for producing high-quality high-k films. During ALD, chemical reactions on the substrate surface involve multiple processes that affect the chemical and electrical properties of the deposited films. Thus, the choice of an appropriate precursor for ALD is critical for obtaining high-quality high-k films, leading to good device performance. The aim of this study is to understand the surface reactions during the film growth along with the evaluation of the electrical properties of HfO2 deposited using two different Hf precursors, HfCl4 and Hf(N(CH3)2)4. The growth behavior and electrical performance of ALD HfO2 thin films obtained using the two Hf precursors and H2O as an oxidant at 250 °C are studied comparatively and discussed as a function of the process parameters, together with surface-reaction energetics determined by the density functional theory. Compared to Hf(N(CH3)2)4, the HfCl4 shows unfavorable nucleation behavior on the starting Si-OH surfaces. In addition, a more stoichiometric HfO2 film results from HfCl4 owing to its high reactivity, leading to lower leakage currents of Si-based devices than that of the film obtained from Hf(N(CH3)2)4. Further, HfCl4 showed better nucleation on a 2D graphene substrate, leading to superior electrical performance in graphene-based field effect transistors. These results provide practical insights on selecting a suitable Hf precursor for producing gate dielectric layers for future nanoelectronics.

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