Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors

Il Kwon Oh, Bo Eun Park, Seunggi Seo, Byung Chul Yeo, Jukka Tanskanen, Han Bo Ram Lee, Woo Hee Kim, Hyungjun Kim

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Physics

Material Science