Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors

Hanearl Jung, Il Kwon Oh, Seungmin Yeo, Hyungjun Kim, Su Jeong Lee, Yun Cheol Kim, Jae Min Myoung, Soo Hyun Kim, Jun Hyung Lim, Sunhee Lee

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3 Citations (Scopus)

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Engineering & Materials Science

Chemistry

Physics & Astronomy