Comparative study on the growth characteristics of ZnO nanowires and thin films by metalorganic chemical vapor deposition (MOCVD)

Min Chang Jeong, Byeong Yun Oh, Woong Lee, Jae Min Myoung

Research output: Contribution to journalArticle

101 Citations (Scopus)

Abstract

Growth characteristics of well-aligned ZnO nanowires and ZnO films by metalorganic chemical vapor deposition were compared. From the estimations of the in-plane residual stress by X-ray diffraction, it was suggested that substantial level of compressive mismatch stress promotes the nucleation of ZnO nanowires. Further examinations of the growth conditions and their correlation with growth modes observed in electron microscopy implied that ZnO nanowire growth is favored by low amount of source supply and high growth temperature. Photoluminescence spectroscopy showed that nanowires have better optical qualities possibly due to the improvement in the crystalline quality by downsizing.

Original languageEnglish
Pages (from-to)149-154
Number of pages6
JournalJournal of Crystal Growth
Volume268
Issue number1-2
DOIs
Publication statusPublished - 2004 Jul 15

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Comparative study on the growth characteristics of ZnO nanowires and thin films by metalorganic chemical vapor deposition (MOCVD)'. Together they form a unique fingerprint.

  • Cite this