Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films