Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

Sang Hyuck Bae, Sang Yeol Lee, Hyun Young Kim, Seongil Im

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Abstract

Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

Original languageEnglish
Pages (from-to)332-334
Number of pages3
JournalApplied Surface Science
Volume168
Issue number1-4
DOIs
Publication statusPublished - 2000 Dec 15

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All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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