Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

Sang Hyuck Bae, Sang Yeol Lee, Hyun Young Kim, Seongil Im

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

Original languageEnglish
Pages (from-to)332-334
Number of pages3
JournalApplied Surface Science
Volume168
Issue number1-4
DOIs
Publication statusPublished - 2000 Dec 15

Fingerprint

Pulsed laser deposition
Optical properties
Thin films
Substrates
Gases
Oxygen
Aluminum Oxide
Silicon
Sapphire
Structural properties
Photoluminescence
X ray diffraction
Wavelength
Lasers
Temperature

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Bae, Sang Hyuck ; Lee, Sang Yeol ; Kim, Hyun Young ; Im, Seongil. / Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition. In: Applied Surface Science. 2000 ; Vol. 168, No. 1-4. pp. 332-334.
@article{ef5cb29fd27248e88f8c02d8dac37e64,
title = "Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition",
abstract = "Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).",
author = "Bae, {Sang Hyuck} and Lee, {Sang Yeol} and Kim, {Hyun Young} and Seongil Im",
year = "2000",
month = "12",
day = "15",
doi = "10.1016/S0169-4332(00)00781-9",
language = "English",
volume = "168",
pages = "332--334",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "1-4",

}

Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition. / Bae, Sang Hyuck; Lee, Sang Yeol; Kim, Hyun Young; Im, Seongil.

In: Applied Surface Science, Vol. 168, No. 1-4, 15.12.2000, p. 332-334.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

AU - Bae, Sang Hyuck

AU - Lee, Sang Yeol

AU - Kim, Hyun Young

AU - Im, Seongil

PY - 2000/12/15

Y1 - 2000/12/15

N2 - Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

AB - Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 °C at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

UR - http://www.scopus.com/inward/record.url?scp=0034512616&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034512616&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(00)00781-9

DO - 10.1016/S0169-4332(00)00781-9

M3 - Article

AN - SCOPUS:0034512616

VL - 168

SP - 332

EP - 334

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 1-4

ER -