Comparison of titanium oxide films grown on bare glass and boiled glass in 50% H2SO4 by metal-organic chemical vapor deposition

H. K. Jang, S. W. Whangbo, Y. D. Chung, T. G. Kim, H. B. Kim, I. W. Lyo, C. N. Whang, C. H. Wang, Doo Jin Choi, T. K. Kim, H. S. Lee

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

The effect of chemical etching of the glass substrate with sulfuric acid on the thermal stability of the titanium oxide thin film prepared by metal organic chemical vapor deposition (MOCVD) at the temperature range of 300-350 °C is investigated. The thickness and stoichiometry of the films were studied by Rutherford backscattering spectrometry (RBS) and the thermal stability of the films were examined with x-ray photoelectron spectroscopy (XPS). Boiling the glass in sulfuric acid was found to be an effective method to extract the sodium and calcium in the glass, and was found to suppress the out-diffusion of sodium and calcium in the titanium oxide.

Original languageEnglish
Pages (from-to)2394-2399
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
DOIs
Publication statusPublished - 2000 Sep 1
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: 2000 Oct 22000 Oct 6

Fingerprint

Organic Chemicals
Titanium oxides
Organic chemicals
titanium oxides
Oxide films
metalorganic chemical vapor deposition
oxide films
Chemical vapor deposition
Metals
sulfuric acid
Sulfuric acid
Glass
glass
calcium
Calcium
Thermodynamic stability
thermal stability
Sodium
sodium
Rutherford backscattering spectroscopy

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Jang, H. K. ; Whangbo, S. W. ; Chung, Y. D. ; Kim, T. G. ; Kim, H. B. ; Lyo, I. W. ; Whang, C. N. ; Wang, C. H. ; Choi, Doo Jin ; Kim, T. K. ; Lee, H. S. / Comparison of titanium oxide films grown on bare glass and boiled glass in 50% H2SO4 by metal-organic chemical vapor deposition. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2000 ; Vol. 18, No. 5. pp. 2394-2399.
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abstract = "The effect of chemical etching of the glass substrate with sulfuric acid on the thermal stability of the titanium oxide thin film prepared by metal organic chemical vapor deposition (MOCVD) at the temperature range of 300-350 °C is investigated. The thickness and stoichiometry of the films were studied by Rutherford backscattering spectrometry (RBS) and the thermal stability of the films were examined with x-ray photoelectron spectroscopy (XPS). Boiling the glass in sulfuric acid was found to be an effective method to extract the sodium and calcium in the glass, and was found to suppress the out-diffusion of sodium and calcium in the titanium oxide.",
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Comparison of titanium oxide films grown on bare glass and boiled glass in 50% H2SO4 by metal-organic chemical vapor deposition. / Jang, H. K.; Whangbo, S. W.; Chung, Y. D.; Kim, T. G.; Kim, H. B.; Lyo, I. W.; Whang, C. N.; Wang, C. H.; Choi, Doo Jin; Kim, T. K.; Lee, H. S.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 18, No. 5, 01.09.2000, p. 2394-2399.

Research output: Contribution to journalConference article

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T1 - Comparison of titanium oxide films grown on bare glass and boiled glass in 50% H2SO4 by metal-organic chemical vapor deposition

AU - Jang, H. K.

AU - Whangbo, S. W.

AU - Chung, Y. D.

AU - Kim, T. G.

AU - Kim, H. B.

AU - Lyo, I. W.

AU - Whang, C. N.

AU - Wang, C. H.

AU - Choi, Doo Jin

AU - Kim, T. K.

AU - Lee, H. S.

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N2 - The effect of chemical etching of the glass substrate with sulfuric acid on the thermal stability of the titanium oxide thin film prepared by metal organic chemical vapor deposition (MOCVD) at the temperature range of 300-350 °C is investigated. The thickness and stoichiometry of the films were studied by Rutherford backscattering spectrometry (RBS) and the thermal stability of the films were examined with x-ray photoelectron spectroscopy (XPS). Boiling the glass in sulfuric acid was found to be an effective method to extract the sodium and calcium in the glass, and was found to suppress the out-diffusion of sodium and calcium in the titanium oxide.

AB - The effect of chemical etching of the glass substrate with sulfuric acid on the thermal stability of the titanium oxide thin film prepared by metal organic chemical vapor deposition (MOCVD) at the temperature range of 300-350 °C is investigated. The thickness and stoichiometry of the films were studied by Rutherford backscattering spectrometry (RBS) and the thermal stability of the films were examined with x-ray photoelectron spectroscopy (XPS). Boiling the glass in sulfuric acid was found to be an effective method to extract the sodium and calcium in the glass, and was found to suppress the out-diffusion of sodium and calcium in the titanium oxide.

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