Comparison of titanium oxide films grown on bare glass and boiled glass in 50% H2SO4 by metal-organic chemical vapor deposition

H. K. Jang, S. W. Whangbo, Y. D. Chung, T. G. Kim, H. B. Kim, I. W. Lyo, C. N. Whang, C. H. Wang, D. J. Choi, T. K. Kim, H. S. Lee

Research output: Contribution to journalConference articlepeer-review

3 Citations (Scopus)


The effect of chemical etching of the glass substrate with sulfuric acid on the thermal stability of the titanium oxide thin film prepared by metal organic chemical vapor deposition (MOCVD) at the temperature range of 300-350 °C is investigated. The thickness and stoichiometry of the films were studied by Rutherford backscattering spectrometry (RBS) and the thermal stability of the films were examined with x-ray photoelectron spectroscopy (XPS). Boiling the glass in sulfuric acid was found to be an effective method to extract the sodium and calcium in the glass, and was found to suppress the out-diffusion of sodium and calcium in the titanium oxide.

Original languageEnglish
Pages (from-to)2394-2399
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number5
Publication statusPublished - 2000 Sep
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: 2000 Oct 22000 Oct 6

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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