Control of ozonated water cleaning process for photoresist removal

Sangwoo Lim, Christopher E.D. Chidsey

Research output: Contribution to journalConference article

Abstract

Ozonated water cleaning is an attractive process for the removal of photoresist in the manufacturing of semiconductor devices. To realize the benefits, a fundamental understanding of the mechanisms of ozone action is needed. This in turn will improve the processes in the current generation of ozone-based tools and will also lead to a broader range of tools and photoresist residues for which ozone chemistries can be effectively deployed.

Original languageEnglish
Pages (from-to)215-218
Number of pages4
JournalDiffusion and Defect Data Pt.B: Solid State Phenomena
Volume76-77
Publication statusPublished - 2000 Dec 1
Event5th Internatinal Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000) - Ostend, Belgium
Duration: 2000 Sep 182000 Sep 20

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Science(all)
  • Condensed Matter Physics
  • Physics and Astronomy (miscellaneous)

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