Control of ozonated water cleaning process for photoresist removal

Sangwoo Lim, Christopher E.D. Chidsey

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)
Original languageEnglish
Title of host publicationUltra Clean Processing of Silicon Surfaces 2000
EditorsMarc Heyns, Paul Mertens, Marc Meuris
PublisherTrans Tech Publications Ltd
Pages215-218
Number of pages4
ISBN (Print)9783908450573
DOIs
Publication statusPublished - 2001 Jan 1
Event5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium
Duration: 2000 Sep 182000 Sep 20

Publication series

NameSolid State Phenomena
Volume76-77
ISSN (Electronic)1662-9779

Other

Other5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
CountryBelgium
CityOstend
Period00/9/1800/9/20

Fingerprint

Photoresists
Cleaning
Water

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Lim, S., & Chidsey, C. E. D. (2001). Control of ozonated water cleaning process for photoresist removal. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces 2000 (pp. 215-218). (Solid State Phenomena; Vol. 76-77). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.76-77.215
Lim, Sangwoo ; Chidsey, Christopher E.D. / Control of ozonated water cleaning process for photoresist removal. Ultra Clean Processing of Silicon Surfaces 2000. editor / Marc Heyns ; Paul Mertens ; Marc Meuris. Trans Tech Publications Ltd, 2001. pp. 215-218 (Solid State Phenomena).
@inproceedings{3e1c7243cc6b4c12a10f441182bf2ac2,
title = "Control of ozonated water cleaning process for photoresist removal",
author = "Sangwoo Lim and Chidsey, {Christopher E.D.}",
year = "2001",
month = "1",
day = "1",
doi = "10.4028/www.scientific.net/SSP.76-77.215",
language = "English",
isbn = "9783908450573",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "215--218",
editor = "Marc Heyns and Paul Mertens and Marc Meuris",
booktitle = "Ultra Clean Processing of Silicon Surfaces 2000",

}

Lim, S & Chidsey, CED 2001, Control of ozonated water cleaning process for photoresist removal. in M Heyns, P Mertens & M Meuris (eds), Ultra Clean Processing of Silicon Surfaces 2000. Solid State Phenomena, vol. 76-77, Trans Tech Publications Ltd, pp. 215-218, 5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000, Ostend, Belgium, 00/9/18. https://doi.org/10.4028/www.scientific.net/SSP.76-77.215

Control of ozonated water cleaning process for photoresist removal. / Lim, Sangwoo; Chidsey, Christopher E.D.

Ultra Clean Processing of Silicon Surfaces 2000. ed. / Marc Heyns; Paul Mertens; Marc Meuris. Trans Tech Publications Ltd, 2001. p. 215-218 (Solid State Phenomena; Vol. 76-77).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Control of ozonated water cleaning process for photoresist removal

AU - Lim, Sangwoo

AU - Chidsey, Christopher E.D.

PY - 2001/1/1

Y1 - 2001/1/1

UR - http://www.scopus.com/inward/record.url?scp=84902989019&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84902989019&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/SSP.76-77.215

DO - 10.4028/www.scientific.net/SSP.76-77.215

M3 - Conference contribution

AN - SCOPUS:84902989019

SN - 9783908450573

T3 - Solid State Phenomena

SP - 215

EP - 218

BT - Ultra Clean Processing of Silicon Surfaces 2000

A2 - Heyns, Marc

A2 - Mertens, Paul

A2 - Meuris, Marc

PB - Trans Tech Publications Ltd

ER -

Lim S, Chidsey CED. Control of ozonated water cleaning process for photoresist removal. In Heyns M, Mertens P, Meuris M, editors, Ultra Clean Processing of Silicon Surfaces 2000. Trans Tech Publications Ltd. 2001. p. 215-218. (Solid State Phenomena). https://doi.org/10.4028/www.scientific.net/SSP.76-77.215