Control of ozonated water cleaning process for photoresist removal

Sangwoo Lim, Christopher E.D. Chidsey

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)
Original languageEnglish
Title of host publicationUltra Clean Processing of Silicon Surfaces 2000
EditorsMarc Heyns, Paul Mertens, Marc Meuris
PublisherTrans Tech Publications Ltd
Pages215-218
Number of pages4
ISBN (Print)9783908450573
DOIs
Publication statusPublished - 2001 Jan 1
Event5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000 - Ostend, Belgium
Duration: 2000 Sep 182000 Sep 20

Publication series

NameSolid State Phenomena
Volume76-77
ISSN (Electronic)1662-9779

Other

Other5th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 2000
CountryBelgium
CityOstend
Period00/9/1800/9/20

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Lim, S., & Chidsey, C. E. D. (2001). Control of ozonated water cleaning process for photoresist removal. In M. Heyns, P. Mertens, & M. Meuris (Eds.), Ultra Clean Processing of Silicon Surfaces 2000 (pp. 215-218). (Solid State Phenomena; Vol. 76-77). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.76-77.215