Control of wall thickness in the formation of ordered mesoporous silica films

Sang Bae Jung, Tae Jung Ha, Hyung-Ho Park

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Ordered mesoporous silica thin films using block copolymer have drawn an attention for low-k application due to its ordered pore structure. From the respect of dielectric and mechanical properties of the film, there is trade-off between pore size and wall thickness. In this work, factors for increase of wall thickness were investigated. It was found that body-centered cubic structure was maintained irrespective of the concentration of catalytic acid. The catalytic acid thickens the framework wall because counterion reduces the repulsion force between silicic acids. The highly ordered mesoporous silica films were obtained although high concentration of acid was added to the silica sol. However, wormlike micelle exists more with high HCl concentration due to fast gellation rate. And excess water, which has the role similar to the humid atmosphere, also increases the thickness of silica wall. However, large amount of excess water at the micelle interface disrupts organic-inorganic electrostatic interaction. As a conclusion, optimization of HCl concentration in the silica sol and control of humidity during spin coating can simultaneously increase the framework thickness while maintaining the pore periodicity.

Original languageEnglish
Pages (from-to)6521-6525
Number of pages5
JournalThin Solid Films
Volume515
Issue number16 SPEC. ISS.
DOIs
Publication statusPublished - 2007 Jun 4

Fingerprint

Silicon Dioxide
Silica
silicon dioxide
acids
Acids
Micelles
Polymethyl Methacrylate
Sols
porosity
micelles
Silicic Acid
Water
Spin coating
Pore structure
Coulomb interactions
block copolymers
Dielectric properties
water
Block copolymers
Pore size

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Jung, Sang Bae ; Ha, Tae Jung ; Park, Hyung-Ho. / Control of wall thickness in the formation of ordered mesoporous silica films. In: Thin Solid Films. 2007 ; Vol. 515, No. 16 SPEC. ISS. pp. 6521-6525.
@article{936b80741888489d91b283e71842f88d,
title = "Control of wall thickness in the formation of ordered mesoporous silica films",
abstract = "Ordered mesoporous silica thin films using block copolymer have drawn an attention for low-k application due to its ordered pore structure. From the respect of dielectric and mechanical properties of the film, there is trade-off between pore size and wall thickness. In this work, factors for increase of wall thickness were investigated. It was found that body-centered cubic structure was maintained irrespective of the concentration of catalytic acid. The catalytic acid thickens the framework wall because counterion reduces the repulsion force between silicic acids. The highly ordered mesoporous silica films were obtained although high concentration of acid was added to the silica sol. However, wormlike micelle exists more with high HCl concentration due to fast gellation rate. And excess water, which has the role similar to the humid atmosphere, also increases the thickness of silica wall. However, large amount of excess water at the micelle interface disrupts organic-inorganic electrostatic interaction. As a conclusion, optimization of HCl concentration in the silica sol and control of humidity during spin coating can simultaneously increase the framework thickness while maintaining the pore periodicity.",
author = "Jung, {Sang Bae} and Ha, {Tae Jung} and Hyung-Ho Park",
year = "2007",
month = "6",
day = "4",
doi = "10.1016/j.tsf.2006.11.062",
language = "English",
volume = "515",
pages = "6521--6525",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "16 SPEC. ISS.",

}

Control of wall thickness in the formation of ordered mesoporous silica films. / Jung, Sang Bae; Ha, Tae Jung; Park, Hyung-Ho.

In: Thin Solid Films, Vol. 515, No. 16 SPEC. ISS., 04.06.2007, p. 6521-6525.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Control of wall thickness in the formation of ordered mesoporous silica films

AU - Jung, Sang Bae

AU - Ha, Tae Jung

AU - Park, Hyung-Ho

PY - 2007/6/4

Y1 - 2007/6/4

N2 - Ordered mesoporous silica thin films using block copolymer have drawn an attention for low-k application due to its ordered pore structure. From the respect of dielectric and mechanical properties of the film, there is trade-off between pore size and wall thickness. In this work, factors for increase of wall thickness were investigated. It was found that body-centered cubic structure was maintained irrespective of the concentration of catalytic acid. The catalytic acid thickens the framework wall because counterion reduces the repulsion force between silicic acids. The highly ordered mesoporous silica films were obtained although high concentration of acid was added to the silica sol. However, wormlike micelle exists more with high HCl concentration due to fast gellation rate. And excess water, which has the role similar to the humid atmosphere, also increases the thickness of silica wall. However, large amount of excess water at the micelle interface disrupts organic-inorganic electrostatic interaction. As a conclusion, optimization of HCl concentration in the silica sol and control of humidity during spin coating can simultaneously increase the framework thickness while maintaining the pore periodicity.

AB - Ordered mesoporous silica thin films using block copolymer have drawn an attention for low-k application due to its ordered pore structure. From the respect of dielectric and mechanical properties of the film, there is trade-off between pore size and wall thickness. In this work, factors for increase of wall thickness were investigated. It was found that body-centered cubic structure was maintained irrespective of the concentration of catalytic acid. The catalytic acid thickens the framework wall because counterion reduces the repulsion force between silicic acids. The highly ordered mesoporous silica films were obtained although high concentration of acid was added to the silica sol. However, wormlike micelle exists more with high HCl concentration due to fast gellation rate. And excess water, which has the role similar to the humid atmosphere, also increases the thickness of silica wall. However, large amount of excess water at the micelle interface disrupts organic-inorganic electrostatic interaction. As a conclusion, optimization of HCl concentration in the silica sol and control of humidity during spin coating can simultaneously increase the framework thickness while maintaining the pore periodicity.

UR - http://www.scopus.com/inward/record.url?scp=34247545620&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34247545620&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2006.11.062

DO - 10.1016/j.tsf.2006.11.062

M3 - Article

AN - SCOPUS:34247545620

VL - 515

SP - 6521

EP - 6525

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 16 SPEC. ISS.

ER -