Controllable resistance switching behavior of NiO/SiO2 double layers for nonvolatile memory applications

Ji Hyuk Choi, Sachindra Nath Das, Jae Min Myoung

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Resistive switching characteristics of the double layer (NiO/ SiO 2) were studied for possible nonvolatile memory applications. The effect of SiO2 thickness variation in the memory device was investigated. A repeatable resistance switching behavior was observed with on/off ratio 105. The operation voltage of the device depended on the thickness of SiO2 layer and it increases with increasing SiO 2 thickness. High-resolution transmission electron microscopy analyses revealed that the formation/rapture of Ni filament like percolation path inside SiO2 layer is responsible for the current transport mechanism.

Original languageEnglish
Article number062105
JournalApplied Physics Letters
Volume95
Issue number6
DOIs
Publication statusPublished - 2009 Aug 27

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Controllable resistance switching behavior of NiO/SiO<sub>2</sub> double layers for nonvolatile memory applications'. Together they form a unique fingerprint.

  • Cite this