Controlling optical properties of Ge-on-Si by thermal annealing and etching process

Chulwon Lee, Bugeun Ki, Yang Seok Yoo, Min Ho Jang, Jungwoo Oh, Yong Hoon Cho

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We studied optical properties of thermally annealed Ge-on-Si. From Raman experiments, tensile strain as well as Si-Ge intermixing were investigated. Significant Γ-band transition peak-shift was confirmed by photoluminescence depending on the thermal annealing conditions.

Original languageEnglish
Title of host publication2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Volume1
ISBN (Electronic)9781467371094
DOIs
Publication statusPublished - 2016 Jan 7
Event11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015 - Busan, Korea, Republic of
Duration: 2015 Aug 242015 Aug 28

Other

Other11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015
CountryKorea, Republic of
CityBusan
Period15/8/2415/8/28

Fingerprint

Tensile strain
Etching
Photoluminescence
Optical properties
etching
Annealing
photoluminescence
optical properties
annealing
shift
Experiments
Hot Temperature

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

Cite this

Lee, C., Ki, B., Yoo, Y. S., Jang, M. H., Oh, J., & Cho, Y. H. (2016). Controlling optical properties of Ge-on-Si by thermal annealing and etching process. In 2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015 (Vol. 1). [7375929] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/CLEOPR.2015.7375929
Lee, Chulwon ; Ki, Bugeun ; Yoo, Yang Seok ; Jang, Min Ho ; Oh, Jungwoo ; Cho, Yong Hoon. / Controlling optical properties of Ge-on-Si by thermal annealing and etching process. 2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 2016.
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Lee, C, Ki, B, Yoo, YS, Jang, MH, Oh, J & Cho, YH 2016, Controlling optical properties of Ge-on-Si by thermal annealing and etching process. in 2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015. vol. 1, 7375929, Institute of Electrical and Electronics Engineers Inc., 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015, Busan, Korea, Republic of, 15/8/24. https://doi.org/10.1109/CLEOPR.2015.7375929

Controlling optical properties of Ge-on-Si by thermal annealing and etching process. / Lee, Chulwon; Ki, Bugeun; Yoo, Yang Seok; Jang, Min Ho; Oh, Jungwoo; Cho, Yong Hoon.

2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015. Vol. 1 Institute of Electrical and Electronics Engineers Inc., 2016. 7375929.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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T1 - Controlling optical properties of Ge-on-Si by thermal annealing and etching process

AU - Lee, Chulwon

AU - Ki, Bugeun

AU - Yoo, Yang Seok

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AU - Oh, Jungwoo

AU - Cho, Yong Hoon

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Lee C, Ki B, Yoo YS, Jang MH, Oh J, Cho YH. Controlling optical properties of Ge-on-Si by thermal annealing and etching process. In 2015 11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015. Vol. 1. Institute of Electrical and Electronics Engineers Inc. 2016. 7375929 https://doi.org/10.1109/CLEOPR.2015.7375929