Correlation between deposition parameters and structural modification of amorphous carbon nitride (a-CNx) film in magnetron sputtering

Hae Suk Jung, Hyung Ho Park

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

The growth and structural evolution of the carbon nitride (CNx) film, deposited by rf magnetron sputtering in Ar/N2 discharge, were studied. The CNx (0.23≤x≤0.71) films were deposited on Si(1 0 0) at rf power between 50 and 250W. Simultaneously, Ar/N2 gas ratio was varied from 0 to 18 with total pressure kept at 6.6 × 10-1Pa. The composition, structure, and chemical bonding configuration of the CNx films were found to be strongly dependent on deposition parameters (rf power and Ar/N2 gas ratio). Based on these results, a relationship between deposition parameter and film properties ([N]/[C] ratio, surface roughness, and sp3/sp2 bond ratio) was established.

Original languageEnglish
Pages (from-to)149-155
Number of pages7
JournalApplied Surface Science
Volume216
Issue number1-4 SPEC.
DOIs
Publication statusPublished - 2003 Jun 30

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Carbon nitride
Amorphous carbon
Magnetron sputtering
Gases
Surface roughness
cyanogen
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

Cite this

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abstract = "The growth and structural evolution of the carbon nitride (CNx) film, deposited by rf magnetron sputtering in Ar/N2 discharge, were studied. The CNx (0.23≤x≤0.71) films were deposited on Si(1 0 0) at rf power between 50 and 250W. Simultaneously, Ar/N2 gas ratio was varied from 0 to 18 with total pressure kept at 6.6 × 10-1Pa. The composition, structure, and chemical bonding configuration of the CNx films were found to be strongly dependent on deposition parameters (rf power and Ar/N2 gas ratio). Based on these results, a relationship between deposition parameter and film properties ([N]/[C] ratio, surface roughness, and sp3/sp2 bond ratio) was established.",
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Correlation between deposition parameters and structural modification of amorphous carbon nitride (a-CNx) film in magnetron sputtering. / Jung, Hae Suk; Park, Hyung Ho.

In: Applied Surface Science, Vol. 216, No. 1-4 SPEC., 30.06.2003, p. 149-155.

Research output: Contribution to journalArticle

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AB - The growth and structural evolution of the carbon nitride (CNx) film, deposited by rf magnetron sputtering in Ar/N2 discharge, were studied. The CNx (0.23≤x≤0.71) films were deposited on Si(1 0 0) at rf power between 50 and 250W. Simultaneously, Ar/N2 gas ratio was varied from 0 to 18 with total pressure kept at 6.6 × 10-1Pa. The composition, structure, and chemical bonding configuration of the CNx films were found to be strongly dependent on deposition parameters (rf power and Ar/N2 gas ratio). Based on these results, a relationship between deposition parameter and film properties ([N]/[C] ratio, surface roughness, and sp3/sp2 bond ratio) was established.

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