Abstract
Ion Beam Synthesis for SiGe layers was performed to study the end-of-range(EOR) defects and strain-induced dislocations. High Ge doses of 5×1016/cm2, 3×1016/cm2 and 2×1016/cm2 at 120 keV were implanted to obtain 12 at%, 7 at% and 5 at% of Ge peak concentrations respectively. RBS spectra show a projected range(Rp) at a depth of 65nm and an amorphous thickness of 170nm on a wafer with 12 at% of Ge peak concentration. Ge ion implantation was performed both at room temperature(RT) and at liquid nitrogen temperature(LNT), in order to investigate the effect of implantation temperature on reducing EOR defect density. Solid phase epitaxial(SPE) annealing for all SiGe layers was done in nitrogen ambient at 800°C. The EOR defect density is considerably reduced by LNT implantation and the strain-induced dislocations have a threshold Ge peak concentration(about 6 at%) for their abrupt generation. For SiGe layer with 12 at% Ge peak concentration, the amorphous-crystalline(a/c) interfacial morphology changes from a planar interface into a faceted interface during SPE growth at 550°C.
| Original language | English |
|---|---|
| Title of host publication | Materials Research Society Symposium Proceedings |
| Publisher | Publ by Materials Research Society |
| Pages | 249-254 |
| Number of pages | 6 |
| ISBN (Print) | 1558991743 |
| Publication status | Published - 1993 Jan 1 |
| Event | Beam Solid Interactions: Fundamentals and Applications - Boston, MA, USA Duration: 1992 Nov 30 → 1992 Dec 4 |
Publication series
| Name | Materials Research Society Symposium Proceedings |
|---|---|
| Volume | 279 |
| ISSN (Print) | 0272-9172 |
Other
| Other | Beam Solid Interactions: Fundamentals and Applications |
|---|---|
| City | Boston, MA, USA |
| Period | 92/11/30 → 92/12/4 |
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All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
Cite this
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Defect-minimized SiGe layer using ion beam synthesis. / Im, Seongil; Washburn, Jack; Gronsky, Ronald; Cheung, Nathan W.; Yu, Kin Man.
Materials Research Society Symposium Proceedings. Publ by Materials Research Society, 1993. p. 249-254 (Materials Research Society Symposium Proceedings; Vol. 279).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - Defect-minimized SiGe layer using ion beam synthesis
AU - Im, Seongil
AU - Washburn, Jack
AU - Gronsky, Ronald
AU - Cheung, Nathan W.
AU - Yu, Kin Man
PY - 1993/1/1
Y1 - 1993/1/1
N2 - Ion Beam Synthesis for SiGe layers was performed to study the end-of-range(EOR) defects and strain-induced dislocations. High Ge doses of 5×1016/cm2, 3×1016/cm2 and 2×1016/cm2 at 120 keV were implanted to obtain 12 at%, 7 at% and 5 at% of Ge peak concentrations respectively. RBS spectra show a projected range(Rp) at a depth of 65nm and an amorphous thickness of 170nm on a wafer with 12 at% of Ge peak concentration. Ge ion implantation was performed both at room temperature(RT) and at liquid nitrogen temperature(LNT), in order to investigate the effect of implantation temperature on reducing EOR defect density. Solid phase epitaxial(SPE) annealing for all SiGe layers was done in nitrogen ambient at 800°C. The EOR defect density is considerably reduced by LNT implantation and the strain-induced dislocations have a threshold Ge peak concentration(about 6 at%) for their abrupt generation. For SiGe layer with 12 at% Ge peak concentration, the amorphous-crystalline(a/c) interfacial morphology changes from a planar interface into a faceted interface during SPE growth at 550°C.
AB - Ion Beam Synthesis for SiGe layers was performed to study the end-of-range(EOR) defects and strain-induced dislocations. High Ge doses of 5×1016/cm2, 3×1016/cm2 and 2×1016/cm2 at 120 keV were implanted to obtain 12 at%, 7 at% and 5 at% of Ge peak concentrations respectively. RBS spectra show a projected range(Rp) at a depth of 65nm and an amorphous thickness of 170nm on a wafer with 12 at% of Ge peak concentration. Ge ion implantation was performed both at room temperature(RT) and at liquid nitrogen temperature(LNT), in order to investigate the effect of implantation temperature on reducing EOR defect density. Solid phase epitaxial(SPE) annealing for all SiGe layers was done in nitrogen ambient at 800°C. The EOR defect density is considerably reduced by LNT implantation and the strain-induced dislocations have a threshold Ge peak concentration(about 6 at%) for their abrupt generation. For SiGe layer with 12 at% Ge peak concentration, the amorphous-crystalline(a/c) interfacial morphology changes from a planar interface into a faceted interface during SPE growth at 550°C.
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M3 - Conference contribution
AN - SCOPUS:0027262041
SN - 1558991743
T3 - Materials Research Society Symposium Proceedings
SP - 249
EP - 254
BT - Materials Research Society Symposium Proceedings
PB - Publ by Materials Research Society
ER -