Degradation of nitride/W/WNx/poly-Si gate stack by post-thermal processes

Heung Jae Cho, Se Aug Jang, Yong Soo Kim, Kwan Yong Lim, Jae Geun Oh, Jung Ho Lee, Tae Su Park, Tae Sun Back, Jun Mo Yang, Hong Seon Yang, Hyun Chul Sohn, Jin Woong Kim

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5 Citations (Scopus)

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