Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al

Young Mi Lee, Yongsup Park, Yeonjin Yi, Jeong Won Kim

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The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.

Original languageEnglish
Article number123301
JournalApplied Physics Letters
Issue number12
Publication statusPublished - 2008 Oct 6


All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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