Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al

Young Mi Lee, Yongsup Park, Yeonjin Yi, Jeong Won Kim

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7 Citations (Scopus)

Abstract

The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.

Original languageEnglish
Article number123301
JournalApplied Physics Letters
Volume93
Issue number12
DOIs
Publication statusPublished - 2008

Bibliographical note

Funding Information:
Y.M.L. was supported by the Kyung Hee University Post-Doctoral Research Associate Fund in 2008 (Grant No. 20080276). PAL was supported by MOST and POSCO. Special thanks are given to Dr. Soonnam Kwon for helpful discussion and to Ms. H.-N. Hwang for experimental assistance.

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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