Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Jin Seung Sohn; Myung Bok Lee; Wan Chin Kim; Eun Hyung Cho; Tae Wan Kim; Chan Young Yoon; No Cheol Park; Young Pil Park

doi:10.1364/AO.44.000506

Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Jin Seung Sohn, Myung Bok Lee, Wan Chin Kim, Eun Hyung Cho, Tae Wan Kim, Chan Young Yoon, No Cheol Park, Young Pil Park

Department of Mechanical Engineering

Research output: Contribution to journal › Article

18 Citations (Scopus)

Abstract

Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.

Original language	English
Pages (from-to)	506-511
Number of pages	6
Journal	Applied Optics
Volume	44
Issue number	4
DOIs	https://doi.org/10.1364/AO.44.000506
Publication status	Published - 2005 Feb 1

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Electrical and Electronic Engineering

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Sohn, J. S., Lee, M. B., Kim, W. C., Cho, E. H., Kim, T. W., Yoon, C. Y., Park, N. C., & Park, Y. P. (2005). Design and fabrication of diffractive optical elements by use of gray-scale photolithography. Applied Optics, 44(4), 506-511. https://doi.org/10.1364/AO.44.000506

@article{53311ee28be6449ba0c54a6ed716238a,

title = "Design and fabrication of diffractive optical elements by use of gray-scale photolithography",

abstract = "Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.",

author = "Sohn, {Jin Seung} and Lee, {Myung Bok} and Kim, {Wan Chin} and Cho, {Eun Hyung} and Kim, {Tae Wan} and Yoon, {Chan Young} and Park, {No Cheol} and Park, {Young Pil}",

year = "2005",

month = feb,

day = "1",

doi = "10.1364/AO.44.000506",

language = "English",

volume = "44",

pages = "506--511",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "The Optical Society",

number = "4",

}

TY - JOUR

T1 - Design and fabrication of diffractive optical elements by use of gray-scale photolithography

AU - Sohn, Jin Seung

AU - Lee, Myung Bok

AU - Kim, Wan Chin

AU - Cho, Eun Hyung

AU - Kim, Tae Wan

AU - Yoon, Chan Young

AU - Park, No Cheol

AU - Park, Young Pil

PY - 2005/2/1

Y1 - 2005/2/1

N2 - Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.

AB - Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.

UR - http://www.scopus.com/inward/record.url?scp=13444301287&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=13444301287&partnerID=8YFLogxK

U2 - 10.1364/AO.44.000506

DO - 10.1364/AO.44.000506

M3 - Article

C2 - 15726946

AN - SCOPUS:13444301287

VL - 44

SP - 506

EP - 511

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

IS - 4

ER -