Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Jin Seung Sohn, Myung Bok Lee, Wan Chin Kim, Eun Hyung Cho, Tae Wan Kim, Chan Young Yoon, No Cheol Park, Young Pil Park

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.

Original languageEnglish
Pages (from-to)506-511
Number of pages6
JournalApplied Optics
Volume44
Issue number4
DOIs
Publication statusPublished - 2005 Feb 1

Fingerprint

Diffractive optical elements
gray scale
Photolithography
photolithography
Fabrication
embossing
fabrication
Diffraction efficiency
photomasks
optical density
miniaturization
profiles
diffraction
lenses
gratings
Microlenses
deviation
Photomasks
Density (optical)
glass

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Sohn, J. S., Lee, M. B., Kim, W. C., Cho, E. H., Kim, T. W., Yoon, C. Y., ... Park, Y. P. (2005). Design and fabrication of diffractive optical elements by use of gray-scale photolithography. Applied Optics, 44(4), 506-511. https://doi.org/10.1364/AO.44.000506
Sohn, Jin Seung ; Lee, Myung Bok ; Kim, Wan Chin ; Cho, Eun Hyung ; Kim, Tae Wan ; Yoon, Chan Young ; Park, No Cheol ; Park, Young Pil. / Design and fabrication of diffractive optical elements by use of gray-scale photolithography. In: Applied Optics. 2005 ; Vol. 44, No. 4. pp. 506-511.
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Sohn, JS, Lee, MB, Kim, WC, Cho, EH, Kim, TW, Yoon, CY, Park, NC & Park, YP 2005, 'Design and fabrication of diffractive optical elements by use of gray-scale photolithography', Applied Optics, vol. 44, no. 4, pp. 506-511. https://doi.org/10.1364/AO.44.000506

Design and fabrication of diffractive optical elements by use of gray-scale photolithography. / Sohn, Jin Seung; Lee, Myung Bok; Kim, Wan Chin; Cho, Eun Hyung; Kim, Tae Wan; Yoon, Chan Young; Park, No Cheol; Park, Young Pil.

In: Applied Optics, Vol. 44, No. 4, 01.02.2005, p. 506-511.

Research output: Contribution to journalArticle

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