Abstract
Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.
| Original language | English |
|---|---|
| Pages (from-to) | 506-511 |
| Number of pages | 6 |
| Journal | Applied Optics |
| Volume | 44 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2005 Feb 1 |
Fingerprint
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
Cite this
}
Design and fabrication of diffractive optical elements by use of gray-scale photolithography. / Sohn, Jin Seung; Lee, Myung Bok; Kim, Wan Chin; Cho, Eun Hyung; Kim, Tae Wan; Yoon, Chan Young; Park, No Cheol; Park, Young Pil.
In: Applied Optics, Vol. 44, No. 4, 01.02.2005, p. 506-511.Research output: Contribution to journal › Article
TY - JOUR
T1 - Design and fabrication of diffractive optical elements by use of gray-scale photolithography
AU - Sohn, Jin Seung
AU - Lee, Myung Bok
AU - Kim, Wan Chin
AU - Cho, Eun Hyung
AU - Kim, Tae Wan
AU - Yoon, Chan Young
AU - Park, No Cheol
AU - Park, Young Pil
PY - 2005/2/1
Y1 - 2005/2/1
N2 - Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.
AB - Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.
UR - http://www.scopus.com/inward/record.url?scp=13444301287&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=13444301287&partnerID=8YFLogxK
U2 - 10.1364/AO.44.000506
DO - 10.1364/AO.44.000506
M3 - Article
C2 - 15726946
AN - SCOPUS:13444301287
VL - 44
SP - 506
EP - 511
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 4
ER -