Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Jin Seung Sohn, Myung Bok Lee, Wan Chin Kim, Eun Hyung Cho, Tae Wan Kim, Chan Young Yoon, No Cheol Park, Young Pil Park

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

Diffractive optical elements (DOEs) are key components in the miniaturization of optical systems because of their planarity and extreme thinness. We demonstrate the fabrication of DOEs by use of gray-scale photolithography with a high-energy-beam sensitive glass photomask. We obtained DOE lenses with continuous phase profiles as small as 800 μm in diameter and 5.9 μm in the outermost grating pitch by selecting a suitable optical density for each height level and optimizing the process variables. Microlenses patterned with eight levels and replicated by UV embossing with the polymer master mold showed a diffraction efficiency of 81.5%, which was sufficiently high for the devices to be used as optical pickups. The effects of deviations in diffraction efficiency between the DOE height and profile design were analyzed.

Original languageEnglish
Pages (from-to)506-511
Number of pages6
JournalApplied Optics
Volume44
Issue number4
DOIs
Publication statusPublished - 2005 Feb 1

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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