In the present study, a microlens illuminated aperture array for optical ROM card system was designed and fabricated using monolithic lithography integration method. Microlens array placed on the array was designed to increase the intensity of light passing the array of apertures with a diameter of 1μm and a period of 15μm. And then Microlens array was fabricated using UV molding as a mean of monolithic lithography integration on aluminum aperture array fabricated using photolithography and reactive ion etching process. Optical properties of the generated optical probes at Talbot distance from aperture array and microlens illuminated aperture array array were measured and compared. The maximum intensity of optical probes of microlens illuminated aperture array increased about 12 times of that of aperture array.