Design and fabrication of multi-aperture plate for multi-ion beam patterning system

Yeonsoon Choi, Tae Gon Kim, Jin Han, Byung-Kwon Min, Young-Joo Kim, Sang Jo Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

For the multi-ion beam patterning system, it is necessary to develop a multi-aperture plate with a beam-controllable aperture device for individual adjustment of multi-ion beams on the stage. It is important to select the appropriate material for the multi-aperture plate to confirm the durability against damage by ion beams since the multi-aperture is located under a relatively strong ion beam. To prepare the controllable aperture system on the bottom side of the multi-aperture plate, the materials must be suitable for the microfabrication process. From an experimental etching test of some candidate materials, a silicon substrate with a magnesium oxide coating was selected for the multi-aperture plate. The structure also includes a Mo mesh on the top surface to solve the surface charging problem caused by ion beams, resulting in improved ion beam penetration through the aperture. Finally, a beam-controllable aperture device was designed with embedded parallel electrodes for durable and stable beam control and fabricated by the silicon microfabrication process.

Original languageEnglish
JournalJapanese Journal of Applied Physics
Volume49
Issue number6 PART 2
DOIs
Publication statusPublished - 2010 Jun 1

Fingerprint

Ion beams
apertures
ion beams
Fabrication
fabrication
Microfabrication
Silicon
Magnesia
Etching
Durability
magnesium oxides
silicon
durability
Coatings
Electrodes
charging
mesh
Substrates
penetration
adjusting

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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abstract = "For the multi-ion beam patterning system, it is necessary to develop a multi-aperture plate with a beam-controllable aperture device for individual adjustment of multi-ion beams on the stage. It is important to select the appropriate material for the multi-aperture plate to confirm the durability against damage by ion beams since the multi-aperture is located under a relatively strong ion beam. To prepare the controllable aperture system on the bottom side of the multi-aperture plate, the materials must be suitable for the microfabrication process. From an experimental etching test of some candidate materials, a silicon substrate with a magnesium oxide coating was selected for the multi-aperture plate. The structure also includes a Mo mesh on the top surface to solve the surface charging problem caused by ion beams, resulting in improved ion beam penetration through the aperture. Finally, a beam-controllable aperture device was designed with embedded parallel electrodes for durable and stable beam control and fabricated by the silicon microfabrication process.",
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Design and fabrication of multi-aperture plate for multi-ion beam patterning system. / Choi, Yeonsoon; Kim, Tae Gon; Han, Jin; Min, Byung-Kwon; Kim, Young-Joo; Lee, Sang Jo.

In: Japanese Journal of Applied Physics, Vol. 49, No. 6 PART 2, 01.06.2010.

Research output: Contribution to journalArticle

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