Design method for compensating lateral beam shift of ground-plane cloak

Yongjune Kim, Sang Ho Lee, Yongshik Lee, Ilsung Seo, Il Suek Koh

Research output: Contribution to journalArticle

Abstract

This paper demonstrates a method to improve the accuracy of the ground-plane cloak by compensating for the lateral beam shift. The lateral beam shift can be compensated by increasing the height of the bump with the upper boundary of the cloak and shifting the reference ground plane downwards in the cloaking region. Moreover, the asymmetric ground-plane cloak, which represents not only the lateral beam shift but also an error of the reflection angle, is also compensated by generating the initial grids unequally. The accuracy of the proposed method is verified via ray tracing simulation.

Original languageEnglish
Pages (from-to)288-298
Number of pages11
JournalInternational Journal of Nanotechnology
Volume13
Issue number4-6
DOIs
Publication statusPublished - 2016 Jan 1

Fingerprint

Ray tracing
shift
ray tracing
grids
simulation

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Kim, Yongjune ; Lee, Sang Ho ; Lee, Yongshik ; Seo, Ilsung ; Koh, Il Suek. / Design method for compensating lateral beam shift of ground-plane cloak. In: International Journal of Nanotechnology. 2016 ; Vol. 13, No. 4-6. pp. 288-298.
@article{163e84aa2b294ebeb048f464ef8acea1,
title = "Design method for compensating lateral beam shift of ground-plane cloak",
abstract = "This paper demonstrates a method to improve the accuracy of the ground-plane cloak by compensating for the lateral beam shift. The lateral beam shift can be compensated by increasing the height of the bump with the upper boundary of the cloak and shifting the reference ground plane downwards in the cloaking region. Moreover, the asymmetric ground-plane cloak, which represents not only the lateral beam shift but also an error of the reflection angle, is also compensated by generating the initial grids unequally. The accuracy of the proposed method is verified via ray tracing simulation.",
author = "Yongjune Kim and Lee, {Sang Ho} and Yongshik Lee and Ilsung Seo and Koh, {Il Suek}",
year = "2016",
month = "1",
day = "1",
doi = "10.1504/IJNT.2016.077079",
language = "English",
volume = "13",
pages = "288--298",
journal = "International Journal of Nanotechnology",
issn = "1475-7435",
publisher = "Inderscience Enterprises Ltd",
number = "4-6",

}

Design method for compensating lateral beam shift of ground-plane cloak. / Kim, Yongjune; Lee, Sang Ho; Lee, Yongshik; Seo, Ilsung; Koh, Il Suek.

In: International Journal of Nanotechnology, Vol. 13, No. 4-6, 01.01.2016, p. 288-298.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Design method for compensating lateral beam shift of ground-plane cloak

AU - Kim, Yongjune

AU - Lee, Sang Ho

AU - Lee, Yongshik

AU - Seo, Ilsung

AU - Koh, Il Suek

PY - 2016/1/1

Y1 - 2016/1/1

N2 - This paper demonstrates a method to improve the accuracy of the ground-plane cloak by compensating for the lateral beam shift. The lateral beam shift can be compensated by increasing the height of the bump with the upper boundary of the cloak and shifting the reference ground plane downwards in the cloaking region. Moreover, the asymmetric ground-plane cloak, which represents not only the lateral beam shift but also an error of the reflection angle, is also compensated by generating the initial grids unequally. The accuracy of the proposed method is verified via ray tracing simulation.

AB - This paper demonstrates a method to improve the accuracy of the ground-plane cloak by compensating for the lateral beam shift. The lateral beam shift can be compensated by increasing the height of the bump with the upper boundary of the cloak and shifting the reference ground plane downwards in the cloaking region. Moreover, the asymmetric ground-plane cloak, which represents not only the lateral beam shift but also an error of the reflection angle, is also compensated by generating the initial grids unequally. The accuracy of the proposed method is verified via ray tracing simulation.

UR - http://www.scopus.com/inward/record.url?scp=84975509132&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84975509132&partnerID=8YFLogxK

U2 - 10.1504/IJNT.2016.077079

DO - 10.1504/IJNT.2016.077079

M3 - Article

VL - 13

SP - 288

EP - 298

JO - International Journal of Nanotechnology

JF - International Journal of Nanotechnology

SN - 1475-7435

IS - 4-6

ER -