TY - JOUR
T1 - Design of a contact probe with high positioning accuracy for plasmonic lithography
AU - Jang, Jinhee
AU - Kim, Yongwoo
AU - Kim, Seok
AU - Jung, Howon
AU - Hahn, Jae Won
N1 - Copyright:
Copyright 2011 Elsevier B.V., All rights reserved.
PY - 2011/3
Y1 - 2011/3
N2 - Plasmonic lithography with a contact probe records nano-meter scale features and has high-throughput owing to its capability to scan in contact mode. The probe is commonly based on a micrometer-scale cantilever, which leads to the tip-positioning problem due to force-deflection that induces lateral tip displacement. We propose a geometrically modified probe to achieve high positioning accuracy. Contrary to a conventional cantilever-tip probe, we designed a "circular probe" with arc-shaped arms that hold the tip in the center. The mechanism is based on the "fixed-fixed beam" concept in material mechanics. To confirm its positioning accuracy, we used a finite element method (FEM) to calculate the tip displacement for a circular probe and compared the results with those using a conventional cantilever-tip probe. The probe was designed considering a silicon-based micro-fabrication process. The designed probe has a square outline boundary with a length of 50â Âμm, four arms, and a pyramidal tip with a height of 5μm. The ratio of the lateral tip displacement to the vertical deflection was evaluated to indicate the accuracy of the probe. The probe has higher positioning accuracy by a factor of 103 and 10 in its approach mode and scan mode, respectively, compared with a cantilever-tip probe. We expect that the probe is suitable for the applications that require high positioning accuracy, such as nanolithography in contact mode and applications based on multiple-probe arrays.
AB - Plasmonic lithography with a contact probe records nano-meter scale features and has high-throughput owing to its capability to scan in contact mode. The probe is commonly based on a micrometer-scale cantilever, which leads to the tip-positioning problem due to force-deflection that induces lateral tip displacement. We propose a geometrically modified probe to achieve high positioning accuracy. Contrary to a conventional cantilever-tip probe, we designed a "circular probe" with arc-shaped arms that hold the tip in the center. The mechanism is based on the "fixed-fixed beam" concept in material mechanics. To confirm its positioning accuracy, we used a finite element method (FEM) to calculate the tip displacement for a circular probe and compared the results with those using a conventional cantilever-tip probe. The probe was designed considering a silicon-based micro-fabrication process. The designed probe has a square outline boundary with a length of 50â Âμm, four arms, and a pyramidal tip with a height of 5μm. The ratio of the lateral tip displacement to the vertical deflection was evaluated to indicate the accuracy of the probe. The probe has higher positioning accuracy by a factor of 103 and 10 in its approach mode and scan mode, respectively, compared with a cantilever-tip probe. We expect that the probe is suitable for the applications that require high positioning accuracy, such as nanolithography in contact mode and applications based on multiple-probe arrays.
UR - http://www.scopus.com/inward/record.url?scp=79955463382&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79955463382&partnerID=8YFLogxK
U2 - 10.1002/sca.20228
DO - 10.1002/sca.20228
M3 - Article
C2 - 21445985
AN - SCOPUS:79955463382
VL - 33
SP - 99
EP - 105
JO - Scanning
JF - Scanning
SN - 0161-0457
IS - 2
ER -