Design of a high positioning contact probe for plasmonic lithography

Jinhee Jang, Yongwoo Kim, Seok Kim, Howon Jung, Jae W. Hahn

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We suggest a geometrically modified probe to achieve high positioning accuracy for plasmonic lithography which can record nanometer scale features and has high throughput. Instead of a cantilever probe, we propose a circular probe which has arc-shaped arms that hold the tip at the center. The modified probe is based on the fixed-fixed beam in material mechanics. To calculate the tip displacement, we used a finite element method (FEM) for a circular probe and compared the results with cantilever probe. We considered a silicon-based micro-fabrication process to design the probe. The probe has a square outline boundary with a length of 50μm, four arms, and a pyramidal tip with a height of 5μm. The ratio of the lateral tip displacement to the vertical deflection was evaluated to indicate the positioning accuracy. The probe has higher accuracy by a factor of 103 and 10 in approach mode and scan mode, respectively, compared to a cantilever probe. We expect that a circular probe is appropriate for the applications that require high positioning accuracy, such as nanolithography with a contact probe and multiple-probe arrays.

Original languageEnglish
Title of host publicationAlternative Lithographic Technologies IV
PublisherSPIE
ISBN (Print)9780819489791
DOIs
Publication statusPublished - 2012 Jan 1
EventAlternative Lithographic Technologies IV - San Jose, CA, United States
Duration: 2012 Feb 132012 Feb 16

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8323
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherAlternative Lithographic Technologies IV
CountryUnited States
CitySan Jose, CA
Period12/2/1312/2/16

Fingerprint

Plasmonics
Lithography
positioning
Positioning
Probe
lithography
Contact
probes
Cantilever
Design
Nanolithography
Microfabrication
Silicon
Deflection
High Throughput
Mechanics
deflection
Lateral
finite element method
High Accuracy

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Jang, J., Kim, Y., Kim, S., Jung, H., & Hahn, J. W. (2012). Design of a high positioning contact probe for plasmonic lithography. In Alternative Lithographic Technologies IV [832322] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8323). SPIE. https://doi.org/10.1117/12.916274
Jang, Jinhee ; Kim, Yongwoo ; Kim, Seok ; Jung, Howon ; Hahn, Jae W. / Design of a high positioning contact probe for plasmonic lithography. Alternative Lithographic Technologies IV. SPIE, 2012. (Proceedings of SPIE - The International Society for Optical Engineering).
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Jang, J, Kim, Y, Kim, S, Jung, H & Hahn, JW 2012, Design of a high positioning contact probe for plasmonic lithography. in Alternative Lithographic Technologies IV., 832322, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8323, SPIE, Alternative Lithographic Technologies IV, San Jose, CA, United States, 12/2/13. https://doi.org/10.1117/12.916274

Design of a high positioning contact probe for plasmonic lithography. / Jang, Jinhee; Kim, Yongwoo; Kim, Seok; Jung, Howon; Hahn, Jae W.

Alternative Lithographic Technologies IV. SPIE, 2012. 832322 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8323).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Jang J, Kim Y, Kim S, Jung H, Hahn JW. Design of a high positioning contact probe for plasmonic lithography. In Alternative Lithographic Technologies IV. SPIE. 2012. 832322. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.916274