Design of antireflective subwavelength grating structure for infrared medical imaging

Xun Zheng, Soonkyu Je, Byungwook Kim, Jongmyeong Shim, Shinill Kang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A subwavelength grating (SWG) structure was designed and simulated on a germanium substrate to reduce the Fresnel reflection of transmissive optical elements. Three different grating structures were compared and analyzed by solving Maxwell's equations using rigorous coupled wave analysis (RCWA) method. The designed antireflective SWG of 2 dimensional sinusoidal structure has pitch of 2.3 μm and pattern height of 3.3 μm for maximum sensitivity of infrared medical camera at wavelength ranging from 8 μm to 12 μm. The 2D photoresist sinusoidal grating structure, to be used as etching barrier for fabrication of antireflective germanium grating structure, was fabricated by laser interference lithography.

Original languageEnglish
Title of host publicationINEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
Pages767-768
Number of pages2
DOIs
Publication statusPublished - 2010 May 5
Event2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, China
Duration: 2010 Jan 32010 Jan 8

Publication series

NameINEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Other

Other2010 3rd International Nanoelectronics Conference, INEC 2010
CountryChina
CityHongkong
Period10/1/310/1/8

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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    Zheng, X., Je, S., Kim, B., Shim, J., & Kang, S. (2010). Design of antireflective subwavelength grating structure for infrared medical imaging. In INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings (pp. 767-768). [5424458] (INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings). https://doi.org/10.1109/INEC.2010.5424458