Abstract
In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.
| Original language | English |
|---|---|
| Article number | 651722 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 6517 |
| Issue number | PART 2 |
| DOIs | |
| Publication status | Published - 2007 |
| Event | Emerging Lithographic Technologies XI - San Jose, CA, United States Duration: 2007 Feb 27 → 2007 Mar 1 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering