Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee; Sinjeung Park; Eungman Lee; Kyoungsik Kim; Jae W. Hahn

doi:10.1117/12.712522

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee, Sinjeung Park, Eungman Lee, Kyoungsik Kim, Jae W. Hahn

Department of Mechanical Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.

Original language	English
Article number	651722
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6517
Issue number	PART 2
DOIs	https://doi.org/10.1117/12.712522
Publication status	Published - 2007
Event	Emerging Lithographic Technologies XI - San Jose, CA, United States Duration: 2007 Feb 27 → 2007 Mar 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.712522

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title = "Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography",

abstract = "In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.",

author = "Yunmi Lee and Sinjeung Park and Eungman Lee and Kyoungsik Kim and Hahn, {Jae W.}",

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note = "Emerging Lithographic Technologies XI ; Conference date: 27-02-2007 Through 01-03-2007",

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Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. / Lee, Yunmi; Park, Sinjeung; Lee, Eungman; Kim, Kyoungsik ; Hahn, Jae W.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 6517, No. PART 2, 651722, 2007.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

AU - Lee, Yunmi

AU - Park, Sinjeung

AU - Lee, Eungman

AU - Kim, Kyoungsik

AU - Hahn, Jae W.

PY - 2007

Y1 - 2007

N2 - In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.

AB - In this paper, based on numerical study using the finite difference time domain method, we designed metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography. The slits were designed to generate higher fringe patterns having high intensity output, high contrast and good uniformity in sub-100nm scale. After fabricating several types of slits on aluminum film mask according to the calculated designs with a focused ion beam facility, lithography experiments using the aluminum slits were performed to record the near-filed fringe patterns using i-line Hg lamp and SU-8 negative photoresist.

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

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T2 - Emerging Lithographic Technologies XI

Y2 - 27 February 2007 through 1 March 2007

ER -

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Abstract

All Science Journal Classification (ASJC) codes

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