Direct beam patterning on metal/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.
|Number of pages||4|
|Journal||Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals|
|Publication status||Published - 2000|
|Event||Proceedings of the Korea-Japan Joint Forum 1999 Organic Materials for Electronics and Photonics - Kyongju, South Korea|
Duration: 1999 Sep 9 → 1999 Sep 11
Bibliographical noteFunding Information:
Acknoldgement This work was supported by grants €tom the Korea Ministry of Science and Technology (98-NF-02-07-A-01) and National Creative Research Initiatives of Ministry of Science and Technology.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics