Development and application of a direct beam lithography for the bioelectronic device

Jeong Woo Choi; Yun Suk Nam; Se Yong Oh; Dongho Kim; Won Hong Lee

doi:10.1080/10587250008024923

Development and application of a direct beam lithography for the bioelectronic device

Jeong Woo Choi, Yun Suk Nam, Se Yong Oh, Dongho Kim, Won Hong Lee

Department of Chemistry

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

Direct beam patterning on metal/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.

Original language	English
Pages (from-to)	295-298
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume	349
DOIs	https://doi.org/10.1080/10587250008024923
Publication status	Published - 2000
Event	Proceedings of the Korea-Japan Joint Forum 1999 Organic Materials for Electronics and Photonics - Kyongju, South Korea Duration: 1999 Sept 9 → 1999 Sept 11

Bibliographical note

Funding Information:
Acknoldgement This work was supported by grants €tom the Korea Ministry of Science and Technology (98-NF-02-07-A-01) and National Creative Research Initiatives of Ministry of Science and Technology.

All Science Journal Classification (ASJC) codes

Condensed Matter Physics

Access to Document

10.1080/10587250008024923

Cite this

@article{93d5ac731486462ba1515766cb8372f6,

title = "Development and application of a direct beam lithography for the bioelectronic device",

abstract = "Direct beam patterning on metal/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.",

author = "Choi, {Jeong Woo} and Nam, {Yun Suk} and Oh, {Se Yong} and Dongho Kim and Lee, {Won Hong}",

note = "Funding Information: Acknoldgement This work was supported by grants €tom the Korea Ministry of Science and Technology (98-NF-02-07-A-01) and National Creative Research Initiatives of Ministry of Science and Technology.; Proceedings of the Korea-Japan Joint Forum 1999 Organic Materials for Electronics and Photonics ; Conference date: 09-09-1999 Through 11-09-1999",

year = "2000",

doi = "10.1080/10587250008024923",

language = "English",

volume = "349",

pages = "295--298",

journal = "Molecular Crystals and Liquid Crystals",

issn = "1542-1406",

publisher = "Taylor and Francis Ltd.",

}

TY - JOUR

T1 - Development and application of a direct beam lithography for the bioelectronic device

AU - Choi, Jeong Woo

AU - Nam, Yun Suk

AU - Oh, Se Yong

AU - Kim, Dongho

AU - Lee, Won Hong

N1 - Funding Information: Acknoldgement This work was supported by grants €tom the Korea Ministry of Science and Technology (98-NF-02-07-A-01) and National Creative Research Initiatives of Ministry of Science and Technology.

PY - 2000

Y1 - 2000

N2 - Direct beam patterning on metal/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.

AB - Direct beam patterning on metal/protein/organic material coated ITO substrates is investigated using laser light for submicron scale lithography. A laser writing lithography method is developed using the 400nm Ti:Sapphire laser. Using a microscope objective lens, a laser beam is focused onto a glass slide coated with metal/protein/organic material film. Localized laser absorption results in partial melting and ablation of film. Spatially moving the laser spot, a stable etched pattern is obtained at submicron resolution. This result opens many possibilities for microfabrication of bioelectronic devices.

UR - http://www.scopus.com/inward/record.url?scp=0034476247&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034476247&partnerID=8YFLogxK

U2 - 10.1080/10587250008024923

DO - 10.1080/10587250008024923

M3 - Conference article

AN - SCOPUS:0034476247

SN - 1542-1406

VL - 349

SP - 295

EP - 298

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

T2 - Proceedings of the Korea-Japan Joint Forum 1999 Organic Materials for Electronics and Photonics

Y2 - 9 September 1999 through 11 September 1999

ER -

Development and application of a direct beam lithography for the bioelectronic device

Abstract

Bibliographical note

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this