Development of 3-axis nano stage for precision positioning in lithography system

Dong Ju Lee, Kang Nyung Lee, No Cheol Park, Young Pil Park, Hyuk Kim, Suk Won Lee, Hyoung Gil Choi, Moon Gu Lee, Jiho Uh, Jung Woo Park, Yong Hwan Choi, Dong Jin Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

15 Citations (Scopus)

Abstract

The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.

Original languageEnglish
Title of host publicationIEEE International Conference on Mechatronics and Automation, ICMA 2005
Pages1598-1603
Number of pages6
Publication statusPublished - 2005 Nov 17
EventIEEE International Conference on Mechatronics and Automation, ICMA 2005 - Niagara Falls, ON, Canada
Duration: 2005 Jul 292005 Aug 1

Publication series

NameIEEE International Conference on Mechatronics and Automation, ICMA 2005

Other

OtherIEEE International Conference on Mechatronics and Automation, ICMA 2005
CountryCanada
CityNiagara Falls, ON
Period05/7/2905/8/1

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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  • Cite this

    Lee, D. J., Lee, K. N., Park, N. C., Park, Y. P., Kim, H., Lee, S. W., Choi, H. G., Lee, M. G., Uh, J., Park, J. W., Choi, Y. H., & Lee, D. J. (2005). Development of 3-axis nano stage for precision positioning in lithography system. In IEEE International Conference on Mechatronics and Automation, ICMA 2005 (pp. 1598-1603). (IEEE International Conference on Mechatronics and Automation, ICMA 2005).