Development of 3-axis nano stage for precision positioning in lithography system

Dong Ju Lee, Kang Nyung Lee, No Cheol Park, Young Pil Park, Hyuk Kim, Suk Won Lee, Hyoung Gil Choi, Moon Gu Lee, Jiho Uh, Jung Woo Park, Yong Hwan Choi, Dong Jin Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

15 Citations (Scopus)

Abstract

The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.

Original languageEnglish
Title of host publicationIEEE International Conference on Mechatronics and Automation, ICMA 2005
Pages1598-1603
Number of pages6
Publication statusPublished - 2005 Nov 17
EventIEEE International Conference on Mechatronics and Automation, ICMA 2005 - Niagara Falls, ON, Canada
Duration: 2005 Jul 292005 Aug 1

Publication series

NameIEEE International Conference on Mechatronics and Automation, ICMA 2005

Other

OtherIEEE International Conference on Mechatronics and Automation, ICMA 2005
CountryCanada
CityNiagara Falls, ON
Period05/7/2905/8/1

Fingerprint

Lithography
Magnetic circuits
Structural design
Design of experiments
Actuators
Specifications
Bandwidth
Experiments

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Lee, D. J., Lee, K. N., Park, N. C., Park, Y. P., Kim, H., Lee, S. W., ... Lee, D. J. (2005). Development of 3-axis nano stage for precision positioning in lithography system. In IEEE International Conference on Mechatronics and Automation, ICMA 2005 (pp. 1598-1603). (IEEE International Conference on Mechatronics and Automation, ICMA 2005).
Lee, Dong Ju ; Lee, Kang Nyung ; Park, No Cheol ; Park, Young Pil ; Kim, Hyuk ; Lee, Suk Won ; Choi, Hyoung Gil ; Lee, Moon Gu ; Uh, Jiho ; Park, Jung Woo ; Choi, Yong Hwan ; Lee, Dong Jin. / Development of 3-axis nano stage for precision positioning in lithography system. IEEE International Conference on Mechatronics and Automation, ICMA 2005. 2005. pp. 1598-1603 (IEEE International Conference on Mechatronics and Automation, ICMA 2005).
@inproceedings{6971fbaf13e942f9a7ced38f98526645,
title = "Development of 3-axis nano stage for precision positioning in lithography system",
abstract = "The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.",
author = "Lee, {Dong Ju} and Lee, {Kang Nyung} and Park, {No Cheol} and Park, {Young Pil} and Hyuk Kim and Lee, {Suk Won} and Choi, {Hyoung Gil} and Lee, {Moon Gu} and Jiho Uh and Park, {Jung Woo} and Choi, {Yong Hwan} and Lee, {Dong Jin}",
year = "2005",
month = "11",
day = "17",
language = "English",
isbn = "0780390458",
series = "IEEE International Conference on Mechatronics and Automation, ICMA 2005",
pages = "1598--1603",
booktitle = "IEEE International Conference on Mechatronics and Automation, ICMA 2005",

}

Lee, DJ, Lee, KN, Park, NC, Park, YP, Kim, H, Lee, SW, Choi, HG, Lee, MG, Uh, J, Park, JW, Choi, YH & Lee, DJ 2005, Development of 3-axis nano stage for precision positioning in lithography system. in IEEE International Conference on Mechatronics and Automation, ICMA 2005. IEEE International Conference on Mechatronics and Automation, ICMA 2005, pp. 1598-1603, IEEE International Conference on Mechatronics and Automation, ICMA 2005, Niagara Falls, ON, Canada, 05/7/29.

Development of 3-axis nano stage for precision positioning in lithography system. / Lee, Dong Ju; Lee, Kang Nyung; Park, No Cheol; Park, Young Pil; Kim, Hyuk; Lee, Suk Won; Choi, Hyoung Gil; Lee, Moon Gu; Uh, Jiho; Park, Jung Woo; Choi, Yong Hwan; Lee, Dong Jin.

IEEE International Conference on Mechatronics and Automation, ICMA 2005. 2005. p. 1598-1603 (IEEE International Conference on Mechatronics and Automation, ICMA 2005).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Development of 3-axis nano stage for precision positioning in lithography system

AU - Lee, Dong Ju

AU - Lee, Kang Nyung

AU - Park, No Cheol

AU - Park, Young Pil

AU - Kim, Hyuk

AU - Lee, Suk Won

AU - Choi, Hyoung Gil

AU - Lee, Moon Gu

AU - Uh, Jiho

AU - Park, Jung Woo

AU - Choi, Yong Hwan

AU - Lee, Dong Jin

PY - 2005/11/17

Y1 - 2005/11/17

N2 - The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.

AB - The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.

UR - http://www.scopus.com/inward/record.url?scp=27744449417&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=27744449417&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:27744449417

SN - 0780390458

T3 - IEEE International Conference on Mechatronics and Automation, ICMA 2005

SP - 1598

EP - 1603

BT - IEEE International Conference on Mechatronics and Automation, ICMA 2005

ER -

Lee DJ, Lee KN, Park NC, Park YP, Kim H, Lee SW et al. Development of 3-axis nano stage for precision positioning in lithography system. In IEEE International Conference on Mechatronics and Automation, ICMA 2005. 2005. p. 1598-1603. (IEEE International Conference on Mechatronics and Automation, ICMA 2005).