Development of a reflective 193-nm DUV microscope system for defect inspection of large optical surfaces

Hong Seung Kim, Dong Ho Lee, Sangwon Hyun, Soon Kyu Je, June Gyu Park, Ji Yong Bae, Geon Hee Kim, I. Jong Kim

Research output: Contribution to journalArticlepeer-review


We developed a 193-nm deep ultraviolet (DUV) microscope system based on the reflection mode for a precise inspection of various ypes of defects/cracks on large optial surfaces of the order of one meter in size. Without preprocessing the sample at room temperature and atmospheric pressure, which is commonly necessary for electron microscopy, the reflective 193-nm DUV microscope was used to directly observe optical surface defects in a manner similar to conventional optical microscopes. In addition, the limitations on the selection of materials and thickness of optical samples of transmittive DUV microscopes were overcome. DUV microscope imaging and the analysis on the spatial resolution were verified using a 1D grating structure with a 225-nm line width. This system could be widely applied as an inspection tool because it provides high resolution at the 200-nm scale that is close to the diffraction limit of a 193-nm DUV beam. In the near future, it is expected that our system would be extended to nano/bio imaging as well as the inspection of large optical surfaces.

Original languageEnglish
Article number525
JournalApplied Sciences (Switzerland)
Issue number23
Publication statusPublished - 2019 Dec 1

Bibliographical note

Publisher Copyright:
© 2019 by the authors. Licensee MDPI, Basel, Switzerland.

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Instrumentation
  • Engineering(all)
  • Process Chemistry and Technology
  • Computer Science Applications
  • Fluid Flow and Transfer Processes


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