Development of a two-chamber process for self-assembling a fluorooctatrichlorosilane monolayer for the nanoimprinting of full-track nanopatterns with a 35 nm half pitch

Sungwoo Choi, Jungjin Han, Jiseok Lim, Joongeok Kim, Hokwan Kim, Seok Min Kim, Shinill Kang

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The technology of depositing a uniform and stable anti-adhesion layer on a wafer-scale nanostamp is a critical issue in the industrialized nan oimprinting process. The deposition of an anti-adhesion layer involves O 2 plasma treatment to modify the stamp surface and the reaction of the monomers with the surface. Although an automated one-chamber system was developed for uniform and stable anti-adhesion layer coating, unwanted molecules are irregularly deposited on a sample during the O 2 plasma treatment due to the contamination of the chamber, leading to the degradation of the anti-adhesion properties. In this paper, a two-chamber self-assembled monolayer (SAM) deposition system was proposed to prevent the degradation of the anti-adhesion properties due to contamination. To examine the effectiveness of the proposed system, the contact angles and chemical compositions of the SAM-coated silicon mold prepared using the one- and two-chamber systems were measured and compared. Finally, 4-in nanoimprinting of 35-nm-half-pitch full-track nanopatterns was conducted using a SAM-coated silicon nanomold prepared using the one- and two-chamber systems, and the replication quality was examined.

Original languageEnglish
Pages (from-to)5921-5927
Number of pages7
JournalJournal of Nanoscience and Nanotechnology
Volume11
Issue number7
DOIs
Publication statusPublished - 2011 Jul 1

Fingerprint

Silicon
assembling
Monolayers
Adhesion
chambers
Self assembled monolayers
adhesion
Fungi
Technology
Contamination
Plasmas
Degradation
contamination
degradation
Contact angle
silicon
Monomers
surface reactions
Coatings
Molecules

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

@article{9874f0603f1c4425b6b10a54caf4e779,
title = "Development of a two-chamber process for self-assembling a fluorooctatrichlorosilane monolayer for the nanoimprinting of full-track nanopatterns with a 35 nm half pitch",
abstract = "The technology of depositing a uniform and stable anti-adhesion layer on a wafer-scale nanostamp is a critical issue in the industrialized nan oimprinting process. The deposition of an anti-adhesion layer involves O 2 plasma treatment to modify the stamp surface and the reaction of the monomers with the surface. Although an automated one-chamber system was developed for uniform and stable anti-adhesion layer coating, unwanted molecules are irregularly deposited on a sample during the O 2 plasma treatment due to the contamination of the chamber, leading to the degradation of the anti-adhesion properties. In this paper, a two-chamber self-assembled monolayer (SAM) deposition system was proposed to prevent the degradation of the anti-adhesion properties due to contamination. To examine the effectiveness of the proposed system, the contact angles and chemical compositions of the SAM-coated silicon mold prepared using the one- and two-chamber systems were measured and compared. Finally, 4-in nanoimprinting of 35-nm-half-pitch full-track nanopatterns was conducted using a SAM-coated silicon nanomold prepared using the one- and two-chamber systems, and the replication quality was examined.",
author = "Sungwoo Choi and Jungjin Han and Jiseok Lim and Joongeok Kim and Hokwan Kim and Kim, {Seok Min} and Shinill Kang",
year = "2011",
month = "7",
day = "1",
doi = "10.1166/jnn.2011.4368",
language = "English",
volume = "11",
pages = "5921--5927",
journal = "Journal of Nanoscience and Nanotechnology",
issn = "1533-4880",
publisher = "American Scientific Publishers",
number = "7",

}

Development of a two-chamber process for self-assembling a fluorooctatrichlorosilane monolayer for the nanoimprinting of full-track nanopatterns with a 35 nm half pitch. / Choi, Sungwoo; Han, Jungjin; Lim, Jiseok; Kim, Joongeok; Kim, Hokwan; Kim, Seok Min; Kang, Shinill.

In: Journal of Nanoscience and Nanotechnology, Vol. 11, No. 7, 01.07.2011, p. 5921-5927.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Development of a two-chamber process for self-assembling a fluorooctatrichlorosilane monolayer for the nanoimprinting of full-track nanopatterns with a 35 nm half pitch

AU - Choi, Sungwoo

AU - Han, Jungjin

AU - Lim, Jiseok

AU - Kim, Joongeok

AU - Kim, Hokwan

AU - Kim, Seok Min

AU - Kang, Shinill

PY - 2011/7/1

Y1 - 2011/7/1

N2 - The technology of depositing a uniform and stable anti-adhesion layer on a wafer-scale nanostamp is a critical issue in the industrialized nan oimprinting process. The deposition of an anti-adhesion layer involves O 2 plasma treatment to modify the stamp surface and the reaction of the monomers with the surface. Although an automated one-chamber system was developed for uniform and stable anti-adhesion layer coating, unwanted molecules are irregularly deposited on a sample during the O 2 plasma treatment due to the contamination of the chamber, leading to the degradation of the anti-adhesion properties. In this paper, a two-chamber self-assembled monolayer (SAM) deposition system was proposed to prevent the degradation of the anti-adhesion properties due to contamination. To examine the effectiveness of the proposed system, the contact angles and chemical compositions of the SAM-coated silicon mold prepared using the one- and two-chamber systems were measured and compared. Finally, 4-in nanoimprinting of 35-nm-half-pitch full-track nanopatterns was conducted using a SAM-coated silicon nanomold prepared using the one- and two-chamber systems, and the replication quality was examined.

AB - The technology of depositing a uniform and stable anti-adhesion layer on a wafer-scale nanostamp is a critical issue in the industrialized nan oimprinting process. The deposition of an anti-adhesion layer involves O 2 plasma treatment to modify the stamp surface and the reaction of the monomers with the surface. Although an automated one-chamber system was developed for uniform and stable anti-adhesion layer coating, unwanted molecules are irregularly deposited on a sample during the O 2 plasma treatment due to the contamination of the chamber, leading to the degradation of the anti-adhesion properties. In this paper, a two-chamber self-assembled monolayer (SAM) deposition system was proposed to prevent the degradation of the anti-adhesion properties due to contamination. To examine the effectiveness of the proposed system, the contact angles and chemical compositions of the SAM-coated silicon mold prepared using the one- and two-chamber systems were measured and compared. Finally, 4-in nanoimprinting of 35-nm-half-pitch full-track nanopatterns was conducted using a SAM-coated silicon nanomold prepared using the one- and two-chamber systems, and the replication quality was examined.

UR - http://www.scopus.com/inward/record.url?scp=84863056207&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84863056207&partnerID=8YFLogxK

U2 - 10.1166/jnn.2011.4368

DO - 10.1166/jnn.2011.4368

M3 - Article

C2 - 22121632

AN - SCOPUS:84863056207

VL - 11

SP - 5921

EP - 5927

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

SN - 1533-4880

IS - 7

ER -