Development of a wide-width raster scanning optical system for high-resolution ultraviolet laser direct micro-patterning

Jong Bok Park, Hyun Choi, Geon Lim, Dong Kil Lee, No Cheol Park, Wan Chin Kim

Research output: Contribution to journalArticle

Abstract

We developed F-theta raster scanning optics for high-resolution ultraviolet (UV) beam direct micro-patterning, capable of machining on a 300-mm wide image with a confined beam spot of less than 20 μm, a 13.5% spot size. To achieve the imaging performance with resolution, F-theta optics based on synthetic silica glass were designed using a high-power laser light source with a wavelength of 355 nm. In addition, to improve the difficulty of optical alignment in conventional systems and the scan linearity between the scan angle and exposing position, F-theta scanning optics were designed to contain two lenses with a rotationally asymmetric high-order polynomial surface. The designed optical system showed a performance of 20 ± 2 μm at the full width of a 1/e2 maximum intensity value through a 0.8 mm focal depth. The scanning linearity error and root-mean-square (RMS) wavefront error were designed to be less than 0.2% and 0.05 λ, respectively. The design performance was verified using optical characteristic measurements and actual patterning experiments with the optics composed of proto lenses

Original languageEnglish
Article number106179
JournalOptics and Lasers in Engineering
Volume134
DOIs
Publication statusPublished - 2020 Nov

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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