Development of highly robust Nano-mixed HfxAlyOz dielectrics for TiN/HfxAlyOz/TiN capacitor applicable to 65nm generation DRAMs

Deok Sin Kil, Kwon Hong, Kee Jeung Lee, Joosung Kim, Han Sang Song, Ki Seon Park, Jae Sung Roh, Hyun Chul Sohn, Jin Woong Kim, Sung Wook Park

Research output: Contribution to journalConference articlepeer-review

9 Citations (Scopus)

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