Development of optical inspection system for detecting malfunctions of digital micromirror device

Minwook Kang, Dong Won Kang, Wondong Lee, Jae W. Hahn

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Maskless lithography (ML) systems have been researched as an alternative technologies of the conventional photolithography systems. Digital micromirror devices (DMD) can be used in ML systems as a role of photomask in the conventional photolithography systems. For high-throughput manufacturing processes DMDs in ML systems must be driven to their operational limits, often in harsh conditions. We propose an optical system and detection methodologies to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. We categorize DMD malfunctions into two types. One is bad DMD pixel caused from mechanical defect and the other is data transfer error. We detect bad DMD pixels with 20×20 pixels using white and black image tests. We confirm data transfer errors at high frame rate operation of DMD by monitoring changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28,000 frames per second (fps).

Original languageEnglish
Title of host publicationInternational Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014
PublisherSPIE
Volume9444
ISBN (Electronic)9781628415599
DOIs
Publication statusPublished - 2015 Jan 1
EventInternational Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014 - Sanur, Bali, Indonesia
Duration: 2014 Oct 142014 Oct 15

Other

OtherInternational Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014
CountryIndonesia
CitySanur, Bali
Period14/10/1414/10/15

Fingerprint

Digital devices
malfunctions
Micromirror
Inspection
inspection
Maskless Lithography
Lithography
lithography
Pixel
Pixels
pixels
Photolithography
Data Transfer
Data transfer
photolithography
Photomasks
Photomask
photomasks
Photoresist
Photoresists

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Kang, M., Kang, D. W., Lee, W., & Hahn, J. W. (2015). Development of optical inspection system for detecting malfunctions of digital micromirror device. In International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014 (Vol. 9444). [944417] SPIE. https://doi.org/10.1117/12.2075175
Kang, Minwook ; Kang, Dong Won ; Lee, Wondong ; Hahn, Jae W. / Development of optical inspection system for detecting malfunctions of digital micromirror device. International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014. Vol. 9444 SPIE, 2015.
@inproceedings{ca1652991530449f8eb28a2bd671ebe6,
title = "Development of optical inspection system for detecting malfunctions of digital micromirror device",
abstract = "Maskless lithography (ML) systems have been researched as an alternative technologies of the conventional photolithography systems. Digital micromirror devices (DMD) can be used in ML systems as a role of photomask in the conventional photolithography systems. For high-throughput manufacturing processes DMDs in ML systems must be driven to their operational limits, often in harsh conditions. We propose an optical system and detection methodologies to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. We categorize DMD malfunctions into two types. One is bad DMD pixel caused from mechanical defect and the other is data transfer error. We detect bad DMD pixels with 20×20 pixels using white and black image tests. We confirm data transfer errors at high frame rate operation of DMD by monitoring changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28,000 frames per second (fps).",
author = "Minwook Kang and Kang, {Dong Won} and Wondong Lee and Hahn, {Jae W.}",
year = "2015",
month = "1",
day = "1",
doi = "10.1117/12.2075175",
language = "English",
volume = "9444",
booktitle = "International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014",
publisher = "SPIE",
address = "United States",

}

Kang, M, Kang, DW, Lee, W & Hahn, JW 2015, Development of optical inspection system for detecting malfunctions of digital micromirror device. in International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014. vol. 9444, 944417, SPIE, International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014, Sanur, Bali, Indonesia, 14/10/14. https://doi.org/10.1117/12.2075175

Development of optical inspection system for detecting malfunctions of digital micromirror device. / Kang, Minwook; Kang, Dong Won; Lee, Wondong; Hahn, Jae W.

International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014. Vol. 9444 SPIE, 2015. 944417.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Development of optical inspection system for detecting malfunctions of digital micromirror device

AU - Kang, Minwook

AU - Kang, Dong Won

AU - Lee, Wondong

AU - Hahn, Jae W.

PY - 2015/1/1

Y1 - 2015/1/1

N2 - Maskless lithography (ML) systems have been researched as an alternative technologies of the conventional photolithography systems. Digital micromirror devices (DMD) can be used in ML systems as a role of photomask in the conventional photolithography systems. For high-throughput manufacturing processes DMDs in ML systems must be driven to their operational limits, often in harsh conditions. We propose an optical system and detection methodologies to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. We categorize DMD malfunctions into two types. One is bad DMD pixel caused from mechanical defect and the other is data transfer error. We detect bad DMD pixels with 20×20 pixels using white and black image tests. We confirm data transfer errors at high frame rate operation of DMD by monitoring changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28,000 frames per second (fps).

AB - Maskless lithography (ML) systems have been researched as an alternative technologies of the conventional photolithography systems. Digital micromirror devices (DMD) can be used in ML systems as a role of photomask in the conventional photolithography systems. For high-throughput manufacturing processes DMDs in ML systems must be driven to their operational limits, often in harsh conditions. We propose an optical system and detection methodologies to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. We categorize DMD malfunctions into two types. One is bad DMD pixel caused from mechanical defect and the other is data transfer error. We detect bad DMD pixels with 20×20 pixels using white and black image tests. We confirm data transfer errors at high frame rate operation of DMD by monitoring changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28,000 frames per second (fps).

UR - http://www.scopus.com/inward/record.url?scp=84922704068&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84922704068&partnerID=8YFLogxK

U2 - 10.1117/12.2075175

DO - 10.1117/12.2075175

M3 - Conference contribution

VL - 9444

BT - International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014

PB - SPIE

ER -

Kang M, Kang DW, Lee W, Hahn JW. Development of optical inspection system for detecting malfunctions of digital micromirror device. In International Seminar on Photonics, Optics, and Its Applications, ISPhOA 2014. Vol. 9444. SPIE. 2015. 944417 https://doi.org/10.1117/12.2075175