We report on the fabrication of ultraviolet (UV)-detecting ZnO-based thin-film transistors (TFTs) and their isolation by energetic B ions. After deposition on a SiO2/p+-Si substrate at 300°C by radio frequency (rf) sputtering, the ZnO layer was patterned with Al source/drain (S/D) contacts and a SiOx window. Then energetic B ions with 30 and 55 keV were implanted onto the deposited structures for device isolation. Among the three samples of unimplanted, 30 keV-, and 55 keV-implanted devices, the 55 keV-implanted one displayed the least gate current leakage (∼100 pA). The ZnO-TFT isolated with 55 keV B also showed a field mobility of 0.7 cm 2/V s and on/off current ratio of more than ∼104, respectively. Under 364 nm UV light of 0.2 mW/cm2 and at zero volts of gate bias, the device exhibited a photo-to-dark current ratio of ∼5 × 103 with a temporal response of about 10 ms.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Materials Chemistry