Difference between chemical structures of the interface at the Al-oxide tunneling barrier prepared by plasma or by radical oxidation

Jongill Hong, Donkoun Lee, Yoonsung Han, Kyenam Lee, Inwoo Jang, Youngjin Park, Min Kyu Lee, Ha Jin Song, Hyun Joon Shin, Koji Tsunekawa, Naoki Watanabe

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy