Direct imprinting of MoS 2 flakes on a patterned gate for nanosheet transistors

Kyunghee Choi, Young Tack Lee, Sung Wook Min, Hee Sung Lee, Taewook Nam, Hyungjun Kim, Seongil Im

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

Nanosheet transistors based on mechanically exfoliated MoS 2 and other transition metal dichalcogenide layers have already been reported demonstrating good device performances. In an approach to synthesize a large area two-dimensional (2D) sheet, chemical vapor deposition methods were reported and the transfer of those sheets onto other arbitrary substrates was also attempted, although studies on the direct imprinting of such 2D semiconductor sheets are rare. Here, we report on a direct imprinting method, the polydimethylsiloxane (PDMS)-adopting approach, that enables the fabrication of patterned bottom-gate MoS 2 nanosheet field-effect transistors (FETs) on any substrate; using direct printing methods MoS 2 FETs were successfully fabricated on glass. Since our FETs were also controlled to be a depletion or an enhanced mode with the modulated MoS 2 thickness on a patterned bottom-gate, our imprinting approach is regarded as a meaningful advance toward 2D nanosheet electronics.

Original languageEnglish
Pages (from-to)7803-7807
Number of pages5
JournalJournal of Materials Chemistry C
Volume1
Issue number47
DOIs
Publication statusPublished - 2013 Dec 21

Fingerprint

Gates (transistor)
Nanosheets
Field effect transistors
Transistors
Substrates
Polydimethylsiloxane
Transition metals
Printing
Chemical vapor deposition
Electronic equipment
Semiconductor materials
Fabrication
Glass

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Chemistry

Cite this

Choi, Kyunghee ; Lee, Young Tack ; Min, Sung Wook ; Lee, Hee Sung ; Nam, Taewook ; Kim, Hyungjun ; Im, Seongil. / Direct imprinting of MoS 2 flakes on a patterned gate for nanosheet transistors In: Journal of Materials Chemistry C. 2013 ; Vol. 1, No. 47. pp. 7803-7807.
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Direct imprinting of MoS 2 flakes on a patterned gate for nanosheet transistors . / Choi, Kyunghee; Lee, Young Tack; Min, Sung Wook; Lee, Hee Sung; Nam, Taewook; Kim, Hyungjun; Im, Seongil.

In: Journal of Materials Chemistry C, Vol. 1, No. 47, 21.12.2013, p. 7803-7807.

Research output: Contribution to journalArticle

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