Direct-patternable SnO2 thin films incorporated with conducting nanostructure materials

Hyuncheol Kim, Hyung-Ho Park

Research output: Contribution to journalArticle

Abstract

There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable SnO2 thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable SnO2 thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the SnO2 thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of SnO2 thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized SnO2 thin films showed a relation between band structural change and electrical resistance. Direct-patterning of SnO2 hybrid films with a line-width of 30 μm was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of SnO2 films can be improved by incorporating Ag nanoparticles and MWNTs.

Original languageEnglish
Pages (from-to)513-517
Number of pages5
JournalKorean Journal of Materials Research
Volume20
Issue number10
DOIs
Publication statusPublished - 2010 Dec 9

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Carbon Nanotubes
Nanostructures
Carbon nanotubes
Thin films
Nanoparticles
Dry etching
Photoresists
Acoustic impedance
Sheet resistance
Opacity
Valence bands
Nanostructured materials
Linewidth
Light absorption
Electric properties
Metals
Scattering
Fabrication
Networks (circuits)

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

@article{dd1dae1f871644f68965d17936efcd11,
title = "Direct-patternable SnO2 thin films incorporated with conducting nanostructure materials",
abstract = "There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable SnO2 thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable SnO2 thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the SnO2 thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of SnO2 thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized SnO2 thin films showed a relation between band structural change and electrical resistance. Direct-patterning of SnO2 hybrid films with a line-width of 30 μm was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of SnO2 films can be improved by incorporating Ag nanoparticles and MWNTs.",
author = "Hyuncheol Kim and Hyung-Ho Park",
year = "2010",
month = "12",
day = "9",
doi = "10.3740/MRSK.2010.20.10.513",
language = "English",
volume = "20",
pages = "513--517",
journal = "Korean Journal of Materials Research",
issn = "1225-0562",
publisher = "The Korea Federation of Science and Technology",
number = "10",

}

Direct-patternable SnO2 thin films incorporated with conducting nanostructure materials. / Kim, Hyuncheol; Park, Hyung-Ho.

In: Korean Journal of Materials Research, Vol. 20, No. 10, 09.12.2010, p. 513-517.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Direct-patternable SnO2 thin films incorporated with conducting nanostructure materials

AU - Kim, Hyuncheol

AU - Park, Hyung-Ho

PY - 2010/12/9

Y1 - 2010/12/9

N2 - There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable SnO2 thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable SnO2 thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the SnO2 thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of SnO2 thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized SnO2 thin films showed a relation between band structural change and electrical resistance. Direct-patterning of SnO2 hybrid films with a line-width of 30 μm was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of SnO2 films can be improved by incorporating Ag nanoparticles and MWNTs.

AB - There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable SnO2 thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable SnO2 thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the SnO2 thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of SnO2 thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized SnO2 thin films showed a relation between band structural change and electrical resistance. Direct-patterning of SnO2 hybrid films with a line-width of 30 μm was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of SnO2 films can be improved by incorporating Ag nanoparticles and MWNTs.

UR - http://www.scopus.com/inward/record.url?scp=78649721504&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78649721504&partnerID=8YFLogxK

U2 - 10.3740/MRSK.2010.20.10.513

DO - 10.3740/MRSK.2010.20.10.513

M3 - Article

AN - SCOPUS:78649721504

VL - 20

SP - 513

EP - 517

JO - Korean Journal of Materials Research

JF - Korean Journal of Materials Research

SN - 1225-0562

IS - 10

ER -