Direct photopatternable organic-inorganic hybrid materials as a low dielectric constant passivation layer for thin film transistor liquid crystal displays

Yangho Jung, Tae Hoon Yeo, Wooseok Yang, Youngwoo Kim, Kyoohee Woo, Jooho Moon

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Direct photopatternable and highly cross-linked organosiloxane-based organic-inorganic hybrid materials (Lt-passimer) were synthesized using a sol-gel reaction of phenyl-trimethoxysilane and tetraethyl orthosilicate as a low dielectric constant passivation layer for thin film transistor (TFT) liquid crystal displays (LCDs). Addition of hexa(methoxymethyl)-melamine into the synthesized hybrid material resin minimizes the polar silanol group in Lt-passimer film by enhancing the cross-linking reaction and improves the thermal stability. The highly cross-linked siloxane network and low concentration of silanol groups cause the Lt-passimer film to have low dielectric constant (k ∼ 2.8) and excellent electrical insulation. Compared with the conventional photosensitive acryl film (k ∼ 3.2), our Lt-passimer films are optically transparent and have a relatively low outgassing and water vapor permeability, which proves the feasibility of Lt-passimer as a low dielectric constant passivation layer in high aperture ratio TFT-LCDs.

Original languageEnglish
Pages (from-to)25056-25062
Number of pages7
JournalJournal of Physical Chemistry C
Volume115
Issue number50
DOIs
Publication statusPublished - 2011 Dec 22

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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