Direct Thermal Growth of Large Scale Cl-doped CdTe Film for Low Voltage High Resolution X-ray Image Sensor

Silah Lee, Jin Sung Kim, Kyeong Rok Ko, Gun Hwan Lee, Dong Jin Lee, Dong wook Kim, Jin Eui Kim, Ho Kyung Kim, Dong Woon Kim, Seongil Im

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4 Citations (Scopus)

Abstract

Polycrystalline cadmium telluride (CdTe) X-ray photodetector with advanced performance was fabricated in a Schottky diode form by direct thermal deposition (evaporation) on pixelized complementary metal oxide semiconductor (CMOS) readout panel. Our CdTe X-ray detector shows such a variety of benefits as relatively low process temperature, low cost, low operation voltage less than 40 V, and higher sensitivity and spatial resolution than those of commercial a-Se detectors. CdTe has cubic Zinc Blende structure and maintains p-type conduction after growth in general. For low voltage operation, we succeeded in Cl doping at all stage of CdTe film deposition, and as a result, hole concentration of p-type CdTe was reduced to ~1012 cm−3 from ~1015 cm−3, and such concentration reduction could enable our Schottky diode with Ti electrode to operate at a reverse bias of less than 40 V. Our CdTe Schottky diode/CMOS pixel array as a direct conversion type imager demonstrates much higher resolution X-ray imaging in 7 × 9 cm2 large scale than that of CsI/CMOS array, an indirect conversion imager. To our limited knowledge, our results on polycrystalline CdTe Schottky diode/CMOS array would be very novel as a first demonstration of active pixel sensor system equipped with directly deposited large scale X-ray detector.

Original languageEnglish
Article number14810
JournalScientific reports
Volume8
Issue number1
DOIs
Publication statusPublished - 2018 Dec 1

All Science Journal Classification (ASJC) codes

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    Lee, S., Kim, J. S., Ko, K. R., Lee, G. H., Lee, D. J., Kim, D. W., Kim, J. E., Kim, H. K., Kim, D. W., & Im, S. (2018). Direct Thermal Growth of Large Scale Cl-doped CdTe Film for Low Voltage High Resolution X-ray Image Sensor. Scientific reports, 8(1), [14810]. https://doi.org/10.1038/s41598-018-33240-1