Discharged photoelectrocatalytic system for the enhancement of photocatalytic performance

Hak Soo Kim; Eun Ah Lee; Chul Hee Han; Jin Wook Ha; Yong Gun Shul; Geng Kun Yoo

doi:10.4028/www.scientific.net/msf.439.205

Discharged photoelectrocatalytic system for the enhancement of photocatalytic performance

Hak Soo Kim, Eun Ah Lee, Chul Hee Han, Jin Wook Ha, Yong Gun Shul, Geng Kun Yoo

Department of Chemical and Biomolecular Engineering

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

The photoelectrocatalytic system is a discharge photocatalytic system aimed at enhancing the photocatalytic performance. In this study, we have obtained experimental data revealing the basic mechanism of the photoelectrocatalytic system. We also report removal of xylene isomers in air using the photoelectrocatalytic system, and these data are compared with our previous data on benzene and toluene. Our analysis based on the Lagmuir-Hinshelwood (L-H) kinetic model shows that the rates of degradation are in the order; benzene < toluene < xylene, in the photoelectrocatalytic system, and explanations are given for the trend.

Original language	English
Pages (from-to)	205-209
Number of pages	5
Journal	Materials Science Forum
Volume	439
DOIs	https://doi.org/10.4028/www.scientific.net/msf.439.205
Publication status	Published - 2003
Event	Eco - Materials Processing and Design - Gyungpodae, Korea, Republic of Duration: 2003 Feb 4 → 2003 Feb 6

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Discharged photoelectrocatalytic system for the enhancement of photocatalytic performance",

abstract = "The photoelectrocatalytic system is a discharge photocatalytic system aimed at enhancing the photocatalytic performance. In this study, we have obtained experimental data revealing the basic mechanism of the photoelectrocatalytic system. We also report removal of xylene isomers in air using the photoelectrocatalytic system, and these data are compared with our previous data on benzene and toluene. Our analysis based on the Lagmuir-Hinshelwood (L-H) kinetic model shows that the rates of degradation are in the order; benzene < toluene < xylene, in the photoelectrocatalytic system, and explanations are given for the trend.",

author = "Kim, {Hak Soo} and Lee, {Eun Ah} and Han, {Chul Hee} and Ha, {Jin Wook} and Shul, {Yong Gun} and Yoo, {Geng Kun}",

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volume = "439",

pages = "205--209",

journal = "Materials Science Forum",

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note = "Eco - Materials Processing and Design ; Conference date: 04-02-2003 Through 06-02-2003",

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AU - Kim, Hak Soo

AU - Lee, Eun Ah

AU - Han, Chul Hee

AU - Ha, Jin Wook

AU - Shul, Yong Gun

AU - Yoo, Geng Kun

PY - 2003

Y1 - 2003

N2 - The photoelectrocatalytic system is a discharge photocatalytic system aimed at enhancing the photocatalytic performance. In this study, we have obtained experimental data revealing the basic mechanism of the photoelectrocatalytic system. We also report removal of xylene isomers in air using the photoelectrocatalytic system, and these data are compared with our previous data on benzene and toluene. Our analysis based on the Lagmuir-Hinshelwood (L-H) kinetic model shows that the rates of degradation are in the order; benzene < toluene < xylene, in the photoelectrocatalytic system, and explanations are given for the trend.

AB - The photoelectrocatalytic system is a discharge photocatalytic system aimed at enhancing the photocatalytic performance. In this study, we have obtained experimental data revealing the basic mechanism of the photoelectrocatalytic system. We also report removal of xylene isomers in air using the photoelectrocatalytic system, and these data are compared with our previous data on benzene and toluene. Our analysis based on the Lagmuir-Hinshelwood (L-H) kinetic model shows that the rates of degradation are in the order; benzene < toluene < xylene, in the photoelectrocatalytic system, and explanations are given for the trend.

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VL - 439

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JO - Materials Science Forum

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T2 - Eco - Materials Processing and Design

Y2 - 4 February 2003 through 6 February 2003

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Discharged photoelectrocatalytic system for the enhancement of photocatalytic performance

Abstract

All Science Journal Classification (ASJC) codes

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